Scott Michael Lane

US Patent:

7214349, May 8, 2007

Filed:

Oct 4, 2001

Appl. No.:

09/970613

Inventors:

Mark Holst - Concord CA, US
Kent Carpenter - Stamford CT, US
Scott Lane - Chandler AZ, US
Prakash V. Arya - New York NY, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B01D 50/00

US Classification:

422169, 422168

Abstract:

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

US Patent:

7670964, Mar 2, 2010

Filed:

Mar 22, 2007

Appl. No.:

11/689572

Inventors:

Scott Lane - Gilbert AZ, US

Assignee:

Tokyo Electron Limited - Tokyo

International Classification:

H01L 21/31

US Classification:

438788

Abstract:

Embodiments of a gas cluster ion beam apparatus and methods for forming a gas cluster ion beam using a low-pressure process source are generally described herein. In one embodiment, the low-pressure process source is mixed with a high-pressure diluent source in a static pump to form a mixed source, from which a gas cluster jet is generated and ionized to form the gas cluster ion beam. Other embodiments may be described and claimed.

US Patent:

7695700, Apr 13, 2010

Filed:

May 7, 2007

Appl. No.:

11/745428

Inventors:

Mark Holst - Concord CA, US
Kent Carpenter - Stamford CT, US
Scott Lane - Chandler AZ, US
Prakash V. Arya - New York NY, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B01D 53/34
B01D 53/38
B01D 53/68

US Classification:

423210, 423240 R

Abstract:

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

US Patent:

20070166205, Jul 19, 2007

Filed:

Oct 24, 2006

Appl. No.:

11/552447

Inventors:

Mark Holst - Concord CA, US
Kent Carpenter - Stamford CT, US
Scott Lane - Chandler AZ, US
Prakash Arya - New York NY, US

International Classification:

B01D 50/00

US Classification:

422169000

Abstract:

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

US Patent:

20090010814, Jan 8, 2009

Filed:

Aug 14, 2007

Appl. No.:

11/838549

Inventors:

Mark Holst - Concord CA, US
Kent Carpenter - Stamford CT, US
Scott Lane - Chandler AZ, US
Prakash V. Arya - New York NY, US

International Classification:

B01D 53/34

US Classification:

422169

Abstract:

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.

US Patent:

58338888, Nov 10, 1998

Filed:

Dec 31, 1996

Appl. No.:

8/778396

Inventors:

Prakash V. Arya - New York NY
Mark Holst - Concord CA
Kent Carpenter - Stamford CT
Scott Lane - Chandler AZ

Assignee:

ATMI Ecosys Corporation - San Jose CA

International Classification:

B01F 304

US Classification:

2611121

Abstract:

A gas/liquid interface structure for transport of a gas stream from an upstream source of same to a downstream processing unit, comprising first and second flow passage members defining an annular volume therebetween, with the second flow passage member extending downwardly to a lower elevation than the lower end of the first flow passage member, with an outer wall member enclosingly circumscribing the second flow passage member and defining therewith an enclosed interior annular volume, and with a liquid flow port in the outer wall member for introducing liquid into the enclosed interior annular volume. The second flow passage member includes an upper liquid-permeable portion in liquid flow communication with the enclosed interior annular volume, whereby liquid from such volume can "weep" through the permeable portion and form a falling liquid film on interior surface portions of the second flow passage member, as a protective liquid interface for the second flow passage member.

US Patent:

58462759, Dec 8, 1998

Filed:

Dec 31, 1996

Appl. No.:

8/778386

Inventors:

Scott Lane - Chandler AZ
Mark Holst - Concord CA

Assignee:

ATMI EcoSys Corporation - San Jose CA

International Classification:

B01D 3500
B01D 5100
B65G 5318

US Classification:

55431

Abstract:

A clog-resistant inlet structure for introducing a particulate solids-containing and/or solids-forming gas stream to a gas processing system, including: a gas-permeable wall enclosing a gas flow path, and an outer annular jacket circumscribing the gas-permeable wall to define an annular gas reservoir therebetween; and a flow passage for introducing a gas into the annular gas reservoir during the flow of the particulate solids-containing and/or solids-forming gas stream to a gas processing system through such inlet structure at a pressure sufficient to cause the gas to permeate through the gas-permeable wall to combat the deposition or formation of solids on the interior surface of the gas-permeable wall. The inlet structure may further optionally include a downstream annular section in which the wall surface bounding the gas stream is blanketed with a falling liquid film, to combat solids deposition or formation on the blanketed wall surface.

US Patent:

63330105, Dec 25, 2001

Filed:

Sep 20, 1999

Appl. No.:

9/400662

Inventors:

Mark Holst - Concord CA
Kent Carpenter - Stamford CT
Scott Lane - Chandler AZ
Prakash V. Arya - New York NY

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

B01D 5334

US Classification:

422171

Abstract:

An effluent gas stream treatment system for treatment of gaseous effluents such as waste gases from semiconductor manufacturing operations. The effluent gas stream treatment system comprises a pre-oxidation treatment unit, which may for example comprise a scrubber, an oxidation unit such an electrothermal oxidizer, and a post-oxidation treatment unit, such as a wet or dry scrubber. The effluent gas stream treatment system of the invention may utilize an integrated oxidizer, quench and wet scrubber assembly, for abatement of hazardous or otherwise undesired components from the effluent gas stream. Gas or liquid shrouding of gas streams in the treatment system may be provided by high efficiency inlet structures.