Yen Ju Wang

age ~59

from San Jose, CA

Get Report

Also known as:

Connected to:

Yen Wang Phones & Addresses

Concentration Profile On Demand Gas Delivery System (Individual Divert Delivery System)
view source
US Patent:

7011710, Mar 14, 2006
Filed:

Apr 10, 2001
Appl. No.:

09/832168
Inventors:

Won Bang - Santa Clara CA, US
Yen Kun Wang - Fremont CA, US
Yeh Jen Kao - San Jose CA, US
Assignee:

Applied Materials Inc. - Santa Clara CA
International Classification:

C23C 16/00
C23F 1/00
H01L 21/306
US Classification:

118715, 118726, 118724, 15634537
Abstract:

Apparatus and method for delivering processing gas are provided. The apparatus for delivering processing gas from a vaporizer to a processing system comprises: a valve connected between the vaporizer and the processing system, the valve having a valve input connected to a vaporizer output and a first valve output connected to a processing system input and a second valve output connected to a bypass line; and a controller for switching the valve between the first valve output and the second valve output. The apparatus may further comprise: a second valve connected between a carrier gas source, a divert gas source and the vaporizer, the second valve having a first valve input connected to the carrier gas source, a second valve input connected to the divert gas source, and a valve output connected to a vaporizer input.

Dual Channel Gas Distribution Plate
view source
US Patent:

61487619, Nov 21, 2000
Filed:

Dec 9, 1998
Appl. No.:

9/207780
Inventors:

Robert Majewski - Scotts Valley CA
Yen Kun Wang - Fremont CA
Assignee:

Applied Materials, Inc. - Santa Clara CA
International Classification:

C23C 1600
US Classification:

118715
Abstract:

A multi-channel faceplate 200, that in some embodiments is monolithic, is provided as a portion of a gas delivery system to a process chamber 100. At least two sets of gas pathways are disposed through a faceplate and allow for independent delivery of separate gases into a process chamber 100. In one embodiment, a first gas pathway, which includes a first set of vertical channels 226, is formed through the faceplate 200. A second gas pathway includes a second set of vertical channels 228, which is formed through a portion of the faceplate and connected to a set of interconnecting horizontal channels 222 in the faceplate 200, where the second gas pathway maintains fluidic separation from the first gas pathway, prior to the gases entering the process chamber 100.