William F Lu

US Patent:

20120255635, Oct 11, 2012

Filed:

Apr 9, 2012

Appl. No.:

13/442813

Inventors:

Sumanth BANDA - San Jose CA, US
Jennifer Y. SUN - Mountain View CA, US
Thomas J. Graves - Los Altos CA, US
Khoi DOAN - San Jose CA, US
William M. LU - Sunnyvale CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

B32B 38/16
B24B 1/00
B32B 38/10

US Classification:

137561 A, 156153, 156701, 451 28

Abstract:

Embodiments described herein generally relate to methods and apparatus for refurbishing a gas distribution plate assembly utilized in a deposition chamber or etch chamber. In one embodiment, a method for refurbishing a gas distribution plate assembly is provided. The method includes urging a faceplate of a gas distribution plate assembly against a polishing pad of a polishing device, the faceplate having a plurality of gas distribution holes disposed therein, providing relative motion between the faceplate and the polishing pad, and polishing the faceplate against the polishing pad.

US Patent:

20120258280, Oct 11, 2012

Filed:

Apr 9, 2012

Appl. No.:

13/442816

Inventors:

Michael Jackson - Sunnyvale CA, US
Tiong Khai Soo - San Jose CA, US
William Ming-Ye Lu - Sunnyvale CA, US
Goichi Yoshidome - Emeryville CA, US
Joseph F. Sommers - San Jose CA, US

Assignee:

APPLIED MATERIALS, INC. - Santa Clara CA

International Classification:

B32B 3/30
C23F 1/00

US Classification:

428141, 216 41, 428156

Abstract:

A processing chamber component and method for fabricating the same are provided. The processing chamber component is fabricated in the manner described herein and includes the creation of at least a macro texture on a surface of the chamber component. The macro texture is defined by a plurality of engineered features arranged in a predefined orientation on the surface of the chamber component. In some embodiments, the engineered features prevent formation of a line of sight surface defined between the features to enhance retention of films deposited on the chamber component.

US Patent:

20120307412, Dec 6, 2012

Filed:

Apr 23, 2012

Appl. No.:

13/453606

Inventors:

Joseph F. Sommers - San Jose CA, US
William M. Lu - Sunnyvale CA, US
Rajan Balesan - Fremont CA, US

Assignee:

Applied Materials, Inc. - Santa Clara CA

International Classification:

H01L 21/687
B23P 6/00

US Classification:

361234, 2940218

Abstract:

The present invention generally relates to a refurbished electrostatic chuck and a method of refurbishing a used electrostatic chuck. Initially, a predetermined amount of dielectric material is removed from the used electrostatic chuck to leave a base surface. Then, the base surface is roughened to enhance the adherence of new dielectric material thereto. The new dielectric material is then sprayed onto the roughened surface. A mask is then placed over the new dielectric material to aid in the formation of mesas upon which a substrate will sit during processing. A portion of the new dielectric layer is then removed to form new mesas. After removing the mask, edges of the mesas may be smoothed and the refurbished electrostatic chuck is ready to return to service after cleaning.

US Patent:

20210062248, Mar 4, 2021

Filed:

Aug 26, 2020

Appl. No.:

17/003544

Inventors:

- South San Francisco CA, US
Kyle Jacoby - Burlingame CA, US
William Lu - Oakland CA, US

Assignee:

PACT Pharma Inc. - South San Francisco CA

International Classification:

C12Q 1/6827
C12N 15/11
C12Q 1/6855

Abstract:

Disclosed herein are methods for identifying the effects, including off target effect, of genomic modification of primary cells. These methods are performed with high accuracy suitable for validating therapeutic T-cell engineering approaches.

US Patent:

20200024725, Jan 23, 2020

Filed:

Jun 28, 2019

Appl. No.:

16/456769

Inventors:

- Santa Clara CA, US
Lizhong SUN - San Jose CA, US
William M. LU - Sunnyvale CA, US

International Classification:

C23C 14/35
C23C 14/50
C23C 14/04
H01J 37/20
H01J 37/32
C23C 14/34

Abstract:

Embodiments of the disclosure generally relate to a process kit including a shield serving as an anode in a physical deposition chamber. The shield has a cylindrical band, the cylindrical band having a top and a bottom, the cylindrical band sized to encircle a sputtering surface of a sputtering target disposed adjacent the top and a substrate support disposed at the bottom, the cylindrical band having an interior surface. A texture is disposed on the interior surface. The texture has a plurality of features. A film is provided on a portion of the features. The film includes a porosity of about 2% to about 3.5%.

US Patent:

20200013589, Jan 9, 2020

Filed:

May 2, 2019

Appl. No.:

16/401871

Inventors:

- Santa Clara CA, US
Sathyanarayana BINDIGANAVALE - Bengaluru, IN
Rajasekhar PATIBANDLA - Bangalore, IN
Balamurugan RAMASAMY - Bangalore, IN
Kartik SHAH - Saratoga CA, US
Umesh M. KELKAR - Santa Clara CA, US
Mats LARSSON - Sunnyvale CA, US
Kevin A. PAPKE - Portland OR, US
William M. LU - Sunnyvale CA, US

International Classification:

H01J 37/32
H01L 21/687
C23C 14/16
C23C 14/06
C23C 16/06
C23C 16/34

Abstract:

Embodiments of the present disclosure are directed towards a protective multilayer coating for process chamber components exposed to temperatures from about 20 C. to about 300 C. during use of the process chamber. The protective multilayer coating comprises a bond layer and a top layer, the bond layer is formed on a chamber component to reduce the stress between the top layer and the chamber component. The reduced stress decreases or prevents particle shedding from the top layer of the multilayer coating during and after use of the process chamber. The bond layer comprises titanium, titanium nitride, aluminum, or combinations thereof, and the top layer comprises tungsten nitride.

US Patent:

20170299487, Oct 19, 2017

Filed:

Apr 13, 2017

Appl. No.:

15/487213

Inventors:

- Santa Clara CA, US
William Ming-ye LU - Sunnyvale CA, US
Yixing LIN - Saratoga CA, US
Kevin A. PAPKE - Portland OR, US

International Classification:

G01N 15/02
B08B 3/12
G01N 15/14

Abstract:

The implementations described herein generally relate to 30 nm in-line liquid particle count testing equipment which analyses and cleans semiconductor processing equipment. More specifically, the implementations described relate to a system for diluting, analyzing, and modifying fluids to enable the observation of the contents of the fluids. A dilution sampling tool is coupled with a liquid particle detector for reading the contents of an extraction solution containing particles from semiconductor processing equipment, such as a liner, a shield, a faceplate, or a showerhead, in a cleaning tank. As such, accurate liquid particle readings may be had which reduce oversaturation of the particle detector.

US Patent:

20170145553, May 25, 2017

Filed:

Nov 9, 2016

Appl. No.:

15/347582

Inventors:

- Santa Clara CA, US
Wenting HOU - Sunnyvale CA, US
Jianxin LEI - Fremont CA, US
Donny YOUNG - Cupertino CA, US
William M. LU - Sunnyvale CA, US

International Classification:

C23C 4/134
C23C 16/455
C23C 16/50
C25D 17/00
C23C 18/48
C23C 14/34
C25D 3/02
C23C 16/44
C23C 18/31

Abstract:

Implementations of the present disclosure relate to an improved shield for use in a processing chamber. In one implementation, the shield includes a hollow body having a cylindrical shape that is substantially symmetric about a central axis of the body, and a coating layer formed on an inner surface of the body. The coating layer is formed the same material as a sputtering target used in the processing chamber. The shield advantageously reduces particle contamination in films deposited using RF-PVD by reducing arcing between the shield and the sputtering target. Arcing is reduced by the presence of a coating layer on the interior surfaces of the shield.