William A Barletta
age ~79
from Chestnut Hill, MA
- Also known as:
-
- Willia Barletta
- Bill Barletta
- Barletta William
William Barletta Phones & Addresses
- Chestnut Hill, MA
- 6316 Bullard Dr, Oakland, CA 94611 • 510 788-4592
- 1029 Longridge Rd, Oakland, CA 94610 • 510 835-9250
- 1530 Beacon St, Brookline, MA 02446 • 617 505-6024
- Alameda, CA
- 6316 Bullard Dr, Oakland, CA 94611
Amazon
Averting Disaster: Science for Peace in a Perilous Age (Paperback) - Common
view sourceDescribes one of the most exciting intellectual and political ventures of the later part of the 20th century, of the decades of the Cold War, a period of bristling East-West tension with the omnipresent possibility that its management might get out of hand, and a war of unimaginable proportion and p...
Author
Edited by William A. Barletta Edited by Henning Wegener
Binding
Paperback
Pages
220
Publisher
World Scientific Publishing Co Pte Ltd
EAN Code
0884921026871
ISBN #
4
Averting Disaster: Science for Peace in a Perilous Age, the Erice International Seminars on Nuclear War and Planetary Emergencies, from 1981 to 2008
view sourceThis is a book of testimonials from participants to the famous Erice International Seminars on Nuclear War and Planetary Emergencies. The Erice International Seminars with their multidisciplinary scientific audiences have addressed, since 1981, a long list of planetary problems and emergencies. This...
Author
Henning Wegener, William A. Barletta
Binding
Paperback
Pages
212
Publisher
World Scientific Publishing Company
ISBN #
981428940X
EAN Code
9789814289405
ISBN #
1
The Physics of Beams Andrew Sessler Symposium: Proceedings of the Symposium held in Los Angeles, CA, December 1993 (AIP Conference Proceedings)
view sourceThis work presents the proceedings of the Andrew Sessler Symposium, the subject of which was the physics of beams. It should be of interest to researchers in the fields of accelerator and beam physics.
Binding
Hardcover
Pages
149
Publisher
American Inst. of Physics
ISBN #
1563963760
EAN Code
9781563963766
ISBN #
2
Charged particle beam weapons (Pulsed power lecture series)
view sourceAuthor
William A Barletta
Binding
Unknown Binding
Publisher
Plasma and Switching Laboratory, Dept. of Electrical Engineering, Texas Tech University
ISBN #
6
The Physics of Beams (AIP Conference Proceedings 351)
view sourceAuthor
William Barletta
Binding
Hardcover
Publisher
American Insitute of Physics
ISBN #
3
Resumes
William Barletta
view sourceUs Patents
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Ultra-Short Ion And Neutron Pulse Production
view source -
US Patent:6985553, Jan 10, 2006
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Filed:Jan 23, 2003
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Appl. No.:10/350573
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Inventors:Ka-Ngo Leung - Hercules CA, US
William A. Barletta - Oakland CA, US
Joe W. Kwan - Castro Valley CA, US -
Assignee:The Regents of the University of California - Oakland CA
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International Classification:G21G 1/06
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US Classification:376158, 361230
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Abstract:An ion source has an extraction system configured to produce ultra-short ion pulses, i. e. pulses with pulse width of about 1 μs or less, and a neutron source based on the ion source produces correspondingly ultra-short neutron pulses. To form a neutron source, a neutron generating target is positioned to receive an accelerated extracted ion beam from the ion source. To produce the ultra-short ion or neutron pulses, the apertures in the extraction system of the ion source are suitably sized to prevent ion leakage, the electrodes are suitably spaced, and the extraction voltage is controlled. The ion beam current leaving the source is regulated by applying ultra-short voltage pulses of a suitable voltage on the extraction electrode.
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Gamma Source For Active Interrogation
view source -
US Patent:7596197, Sep 29, 2009
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Filed:Aug 7, 2006
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Appl. No.:11/462999
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Inventors:Ka-Ngo Leung - Hercules CA, US
Tak Pui Lou - Berkeley CA, US
William A. Barletta - Oakland CA, US -
Assignee:The Regents of the University of California - Oakland CA
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International Classification:G21B 1/00
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US Classification:376108, 376151, 376190, 376156, 2504921
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Abstract:A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360 and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
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High Brightness—Multiple Beamlets Source For Patterned X-Ray Production
view source -
US Patent:7609815, Oct 27, 2009
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Filed:Jun 1, 2007
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Appl. No.:11/757137
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Inventors:Ka-Ngo Leung - Hercules CA, US
Qing Ji - Albany CA, US
William A. Barletta - Oakland CA, US
Ximan Jiang - El Cerrito CA, US
Lili Ji - Albany CA, US -
Assignee:The Regents of the University of California - Oakland CA
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International Classification:H01J 35/06
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US Classification:378136, 378138
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Abstract:Techniques for controllably directing beamlets to a target substrate are disclosed. The beamlets may be either positive ions or electrons. It has been shown that beamlets may be produced with a diameter of 1 μm, with inter-aperture spacings of 12 μm. An array of such beamlets, may be used for maskless lithography. By step-wise movement of the beamlets relative to the target substrate, individual devices may be directly e-beam written. Ion beams may be directly written as well. Due to the high brightness of the beamlets from extraction from a multicusp source, exposure times for lithographic exposure are thought to be minimized. Alternatively, the beamlets may be electrons striking a high Z material for X-ray production, thereafter collimated to provide patterned X-ray exposures such as those used in CAT scans. Such a device may be used for remote detection of explosives.
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Gamma Source For Active Interrogation
view source -
US Patent:8279993, Oct 2, 2012
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Filed:Aug 14, 2009
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Appl. No.:12/541423
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Inventors:Ka-Ngo Leung - Hercules CA, US
Tak Pui Lou - Berkeley CA, US
William A. Barletta - Brookline MA, US -
Assignee:The Regents of the University of California - Oakland CA
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International Classification:G21G 1/12
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US Classification:376157, 376156, 250423 R, 2504921
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Abstract:A cylindrical gamma generator includes a coaxial RF-driven plasma ion source and target. A hydrogen plasma is produced by RF excitation in a cylindrical plasma ion generator using an RF antenna. A cylindrical gamma generating target is coaxial with the ion generator, separated by plasma and extraction electrodes which has many openings. The plasma generator emanates ions radially over 360 and the cylindrical target is thus irradiated by ions over its entire circumference. The plasma generator and target may be as long as desired.
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Universal Pattern Generator With Multiplex Addressing
view source -
US Patent:20040051053, Mar 18, 2004
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Filed:May 22, 2003
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Appl. No.:10/443574
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Inventors:William Barletta - Oakland CA, US
Ka-Ngo Leung - Hercules CA, US -
International Classification:A61N005/00
G21G005/00 -
US Classification:250/492100
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Abstract:A maskless micro-ion-beam reduction lithography (MMRL) system generates patterns of beamlets by switching individual beamlets on or off using a universal pattern generator which is positioned as the extraction electrode of the plasma source. Each aperture of the pattern generator is independently controlled to pass a beamlet. A multiplex addressing system to the individual apertures of the MMRL system is used to reduce the number of electrical connections. An additional layer of control electrodes is added. All apertures in each row of a first layer are connected to a single row address line. All apertures in each column of a second layer are connected to a single column address line. By using the combination of row and column lines, each aperture can be controlled.
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Maskless Micro-Ion-Beam Reduction Lithography System
view source -
US Patent:6888146, May 3, 2005
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Filed:Apr 9, 1999
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Appl. No.:09/289332
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Inventors:Ka-Ngo Leung - Hercules CA, US
William A. Barletta - Oakland CA, US
David O. Patterson - Annandale VA, US
Richard A. Gough - Kensington CA, US -
Assignee:The Regents of the University of California - Oakland CA
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International Classification:H01J003/18
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US Classification:250398, 2504923, 2504931, 250396 R, 2504921, 250423 R
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Abstract:A maskless micro-ion-beam reduction lithography system is a system for projecting patterns onto a resist layer on a wafer with feature size down to below 100 nm. The MMRL system operates without a stencil mask. The patterns are generated by switching beamlets on and off from a two electrode blanking system or pattern generator. The pattern generator controllably extracts the beamlet pattern from an ion source and is followed by a beam reduction and acceleration column.
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Physicists plan to build a bigger LHC
view source- explicit mission, he says, is to explore the physics that a future proton collider might investigate. William Barletta, an accelerator physicist at the Massachusetts Institute of Technology in Cambridge, says that this work is crucial to identify a machine size that will maximize the science per dollar.
- Date: Nov 12, 2013
- Category: Sci/Tech
- Source: Google
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