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Vikas R Amrelia

age ~57

from Austin, TX

Also known as:
  • Vikas Rameschandra Amrelia
  • Vikas Rameshchandra Amrelia
  • Vikas V Amrelia
  • Vikas Amerilia
  • Vikas Armelia
  • Dikas R Amarelia
  • Amrelia Vikas

Vikas Amrelia Phones & Addresses

  • Austin, TX
  • Mesa, AZ
  • 480 Harvard Ave, Gilbert, AZ 85233 • 480 545-0239 • 480 656-8420
  • 5391 Cardinal St, Gilbert, AZ 85233 • 480 656-8420
  • Chandler, AZ
  • Maricopa, AZ
  • Soddy Daisy, TN

Resumes

Vikas Amrelia Photo 1

Gpu Physical Design Engineer

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Location:
5200 Via Besso Dr, Austin, TX
Industry:
Semiconductors
Work:
Apple
Gpu Physical Design Engineer

Marvell Semiconductor May 2014 - Jan 2017
Cpu and Soc Physical Design Engineer

Intel Corporation Aug 2011 - May 2014
Soc Physical Design Engineer

Marvell Semiconductor Nov 2006 - Aug 2011
Soc and Physical Design Lead

Intel Corporation Jan 1996 - Nov 2006
Cpu Physical Design Engineer
Education:
University of Phoenix 1998 - 1999
Master of Business Administration, Masters, Management
University of North Carolina at Charlotte 1995 - 1995
Master of Science, Masters, Engineering
Maharaja Sayajirao University 1986 - 1990
Bachelor of Engineering, Bachelors, Electrical Engineering
Skills:
Floorplanning
Primetime
Logic Synthesis
Physical Design
Dft
Modelsim
Asic
Ic
Soc
Clock Tree Synthesis
Synopsys Tools
Timing
Static Timing Analysis
Microprocessors
Compilers
Formal Verification
Signal Integrity
Crosstalk
Redhawk
Apache
Processors
Application Specific Integrated Circuits
System on A Chip
Interests:
Environment
Education
Poverty Alleviation
Disaster and Humanitarian Relief
Human Rights
Animal Welfare
Vikas Amrelia Photo 2

Vikas Amrelia

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Us Patents

  • Tap Connections For Circuits With Leakage Suppression Capability

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  • US Patent:
    6388315, May 14, 2002
  • Filed:
    Aug 29, 2001
  • Appl. No.:
    09/941829
  • Inventors:
    Lawrence T. Clark - Phoenix AZ
    Vikas R. Amrelia - Gilbert AZ
    Raphael A. Soetan - Chandler AZ
    Eric J. Hoffman - Chandler AZ
    Tuan X. Do - Chandler AZ
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L 2352
  • US Classification:
    257691, 257356, 257357
  • Abstract:
    An integrated circuit biases the substrate and well using voltages other than those used for power and ground. Tap cells inside the standard cell circuits are removed. New tap cells used to bias the substrate and well reside outside the standard cell circuits. The location of the new voltage power rails is designated prior to placement of the tap cells in the integrated circuit. The tap cells are then strategically placed near the power rails such that metal connections are minimized. Circuit density is thus not adversely impacted by the addition of the new power rails. Transistors are also placed inside the tap cells to address electrostatic discharge issues during fabrication.
  • Tap Connections For Circuits With Leakage Suppression Capability

    view source
  • US Patent:
    RE42776, Oct 4, 2011
  • Filed:
    May 23, 2007
  • Appl. No.:
    11/802556
  • Inventors:
    Lawrence T. Clark - Phoenix AZ, US
    Vikas R. Amrelia - Gilbert AZ, US
    Raphael A. Soetan - Chandler AZ, US
    Eric J. Hoffman - Chandler AZ, US
    Tuan X. Do - Chandler AZ, US
  • Assignee:
    Marvell International Ltd. - Hamilton
  • International Classification:
    H01L 23/52
  • US Classification:
    257691, 257204, 257206, 257207, 257208, 257369, 257371, 257E2163, 257E27107, 257E27108, 257E27067, 257355, 257356, 257357, 257358, 257360, 257363, 257291, 257338
  • Abstract:
    An integrated circuit biases the substrate and well using voltages other than those used for power and ground. Tap cells inside the standard cell circuits are removed. New tap cells used to bias the substrate and well reside outside the standard cell circuits. The location of the new voltage power rails is designated prior to placement of the tap cells in the integrated circuit. The tap cells are then strategically placed near the power rails such that metal connections are minimized. Circuit density is thus not adversely impacted by the addition of the new power rails. Transistors are also placed inside the tap cells to address electrostatic discharge issues during fabrication.
  • Tap Connections For Circuits With Leakage Suppression Capability

    view source
  • US Patent:
    RE43326, Apr 24, 2012
  • Filed:
    May 24, 2007
  • Appl. No.:
    11/802763
  • Inventors:
    Lawrence T. Clark - Phoenix AZ, US
    Vikas R. Amrelia - Gilbert AZ, US
    Raphael A. Soetan - Chandler AZ, US
    Eric J. Hoffman - Chandler AZ, US
    Tuan X. Do - Chandler AZ, US
  • Assignee:
    Marvell International Ltd. - Hamilton
  • International Classification:
    H01L 21/20
  • US Classification:
    438395, 438393, 438394, 361637, 361638, 361639, 307 58, 307147, 307148
  • Abstract:
    An integrated circuit biases the substrate and well using voltages other than those used for power and ground. Tap cells inside the standard cell circuits are removed. New tap cells used to bias the substrate and well reside outside the standard cell circuits. The location of the new voltage power rails is designated prior to placement of the tap cells in the integrated circuit. The tap cells are then strategically placed near the power rails such that metal connections are minimized. Circuit density is thus not adversely impacted by the addition of the new power rails. Transistors are also placed inside the tap cells to address electrostatic discharge issues during fabrication.
  • Tap Connections For Circuits With Leakage Suppression Capability

    view source
  • US Patent:
    20020026261, Feb 28, 2002
  • Filed:
    Aug 29, 2001
  • Appl. No.:
    09/941489
  • Inventors:
    Lawrence Clark - Phoenix AZ, US
    Vikas Amrelia - Gilbert AZ, US
    Raphael Soetan - Chandler AZ, US
    Eric Hoffman - Chandler AZ, US
    Tuan Do - Chandler AZ, US
  • International Classification:
    G06F019/00
  • US Classification:
    700/121000
  • Abstract:
    An integrated circuit biases the substrate and well using voltages other than those used for power and ground. Tap cells inside the standard cell circuits are removed. New tap cells used to bias the substrate and well reside outside the standard cell circuits. The location of the new voltage power rails is designated prior to placement of the tap cells in the integrated circuit. The tap cells are then strategically placed near the power rails such that metal connections are minimized. Circuit density is thus not adversely impacted by the addition of the new power rails. Transistors are also placed inside the tap cells to address electrostatic discharge issues during fabrication.
  • Tap Connections For Circuits With Leakage Suppression Capability

    view source
  • US Patent:
    6368933, Apr 9, 2002
  • Filed:
    Dec 15, 1999
  • Appl. No.:
    09/464023
  • Inventors:
    Lawrence T. Clark - Phoenix AZ
    Vikas R. Amrelia - Gilbert AZ
    Raphael A. Soetan - Chandler AZ
    Eric J. Hoffman - Chandler AZ
    Tuan X. Do - Chandler AZ
  • Assignee:
    Intel Corporation - Santa Clara CA
  • International Classification:
    H01L 2120
  • US Classification:
    438395, 438393, 438394, 361637, 361638, 361639, 307 58, 307147, 307148
  • Abstract:
    An integrated circuit biases the substrate and well using voltages other than those used for power and ground. Tap cells inside the standard cell circuits are removed. New tap cells used to bias the substrate and well reside outside the standard cell circuits. The location of the new voltage power rails is designated prior to placement of the tap cells in the integrated circuit. The tap cells are then strategically placed near the power rails such that metal connections are minimized. Circuit density is thus not adversely impacted by the addition of the new power rails. Transistors are also placed inside the tap cells to address electrostatic discharge issues during fabrication.
Name / Title
Company / Classification
Phones & Addresses
Vikas R Amrelia
Manager
DIVANN INVESTMENTS LLC
Investor
5391 S Cardinal St, Gilbert, AZ 85298

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Vikas Amrelia

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Engineer at Marvell Semiconductor

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