The United States of America as represented by the Administrator of the National Aeronautics and Space Administration - Washington DC
International Classification:
H01L 2120 H01L 21324 H01L 2184
US Classification:
148174
Abstract:
Low-cost polycrystalline silicon solar cells supported on substrates are prepared by depositing successive layers of polycrystalline silicon containing appropriate dopants over supporting substrates of a member selected from the group consisting of metallurgical-grade polycrystalline silicon, graphite and steel coated with a diffusion barrier of silica, borosilicate, phosphosilicate, or mixtures thereof such that p-n junction devices are formed which effectively convert solar energy to electrical energy. To improve the conversion efficiency of the polycrystalline silicon solar cells, the crystallite size in the silicon is substantially increased by melting and solidifying a base layer of polycrystalline silicon before depositing the layers which form the p-n junction.
Fabrication Of Polycrystalline Solar Cells On Low-Cost Substrates
The United States of America as represented by the Administrator of the National Aeronautics and Space Administration - Washington DC
International Classification:
H01L 3100 H01L 2714 H01L 2904
US Classification:
148174
Abstract:
Low-cost polycrystalline silicon cells supported on substrates are prepared by depositing successive layers of polycrystalline silicon containing appropriate dopants over supporting substrates of a member selected from the group consisting of metallurgical-grade polycrystalline silicon, graphite and steel coated with a diffusion barrier of silica, borosilicate, phosphosilicate, or mixtures thereof such that p-n junction devices are formed which effectively convert solar energy to electrical energy.
Method For Production Of Polysilanes And Polygermanes, And Deposition Of Hydrogenated Amorphous Silicon, Alloys Thereof, Or Hydrogenated Amorphous Germanium
Ting L. Chu - Dallas TX Shirley S. Chu - Dallas TX
Assignee:
Electric Power Research Institute, Inc. - Palo Alto CA
International Classification:
B05D 306
US Classification:
427 35
Abstract:
A process is provided for forming high purity polysilanes or polygermanes by electric discharge wherein the monosilane or monogermane is provided in a gaseous mixture with a carrier gas at atmospheric pressure. The polysilanes or polygermanes produced at atmospheric pressure are further deposited by various means onto a substrate as hydrogenated amorphous silicon or germanium. The polysilane may also be used for the deposition of hydrogenated amorphous silicon alloys.