Thomas A Lynch

Address:

45 Pickering St APT 7, Fall River, MA 02720

VIN:

KMHDU4AD4AU914188

Make:

HYUNDAI

Model:

ELANTRA

Year:

2010

Author:

Thomas Lynch

ISBN #:

0140276238

Author:

Thomas Lynch

ISBN #:

0199206805

Author:

Thomas Lynch

ISBN #:

0224039733

Author:

Thomas Lynch

ISBN #:

0393041123

Author:

Thomas Lynch

ISBN #:

0393042065

Author:

Thomas Lynch

ISBN #:

0393046591

Author:

Thomas Lynch

ISBN #:

0393049272

Author:

Thomas Lynch

ISBN #:

0393319733

US Patent:

56462182, Jul 8, 1997

Filed:

Aug 5, 1996

Appl. No.:

8/692306

Inventors:

Thomas J. Lynch - North Easton MA
Chester J. Sobodacha - Coventry RI
Dana L. Durham - East Greenwich RI

Assignee:

Hoechst-Celanese Corp. - Somerville NJ

International Classification:

C08F28300
C08G 828
C08L 6100
C08L 6106

US Classification:

525501

Abstract:

The present invention relates to a water insoluble, aqueous alkali soluble novolak resin blend, wherein the resin blend comprises two novolaks having dissimilar relative molecular weights and similar dissolution rates, a process for producing such a resin blend, a photoresist containing such a resin blend and a method for producing a semi-conductor device utilizing such a photoresist.

US Patent:

52485854, Sep 28, 1993

Filed:

Dec 18, 1991

Appl. No.:

7/810634

Inventors:

Thomas J. Lynch - Sharon MA
Dana L. Durham - E. Greenwich RI
Chester Sobodacha - Coventry RI

Assignee:

Hoechst Celanese Corporation - Somerville NJ

International Classification:

G03F 7023
G03F 732
G03C 173

US Classification:

430326

Abstract:

This invention relates to novel radiation sensitive compositions. More particularly the invention relates to photoresists containing phosphorus and nitrogen linked polymers; i. e. , polyphosphazenes, useful in the preparation of a relief pattern on a substrate; e. g. , a silicon wafer or aluminum plate. The polyphosphazenes of in this invention can be synthesized by the condensation of N-trimethylsilylalkoxyphosphorimides. Radiation sensitive positive photoresist compositions of the invention can be developed in aqueous base developer or organic solvent developer The base developer dissolution properties of the composition can be controlled by incorporating carboxylate groups into the polyphosphazene. The polyphosphazenes utilized in this invention have good solubility properties in various organic solvents and also have good mechanical, electrical, adhesion and thermal properties.

US Patent:

53746937, Dec 20, 1994

Filed:

Dec 29, 1992

Appl. No.:

7/996924

Inventors:

Thomas J. Lynch - North Easton MA
Chester J. Sobodacha - Coventry RI
Dana L. Durham - East Greenwich RI

Assignee:

Hoechst Celanese Corporation - Somerville NJ

International Classification:

C08G 828

US Classification:

525501

Abstract:

The present invention relates to a water insoluble. aqueous alkali soluble novolak resin blend, wherein the resin blend comprises two novolaks having dissimilar relative molecular weights and similar dissolution rates, a process for producing such a resin blend, a photoresist containing such a resin blend and a method for producing a semi-conductor device utilizing such a photoresist.

US Patent:

53881834, Feb 7, 1995

Filed:

Sep 30, 1991

Appl. No.:

7/767437

Inventors:

Thomas E. Lynch - Brighton MA

Assignee:

Kurzwell Applied Intelligence, Inc. - Waltham MA

International Classification:

G10C 708
G10L 708

US Classification:

395 251

Abstract:

In the speech recognition system disclosed herein, the Viterbi decoding of an acoustic recognition network is augmented by implementing additional data structures for each arc in the network which represent, for each arc, the best path cost of reaching the last point on that arc and an arc in time which represents, for the best path, the time of leaving the previous arc. These additional data structures enable a trace back procedure which identifies not only the presumably optimal path but also alternate paths having good scores.

US Patent:

55464998, Aug 13, 1996

Filed:

May 27, 1994

Appl. No.:

8/250696

Inventors:

Thomas E. Lynch - Brighton MA
Vladimir Sejnoha - Cambridge MA
Thomas E. Dinger - Waltham MA

Assignee:

Kurzweil Applied Intelligence, Inc. - Waltham MA

International Classification:

G10L 506

US Classification:

395 249

Abstract:

An input utterance is converted to a sequence of standard or prototype data frames which are compared with word models which are represented by respective sequences of standard or prototype probability states, there being a pre-calculable distance metric representing the degree of match between each prototype data frame and each prototype model state. Only distance measurements better than a calculated threshold are considered meaningful and those meaningful metrics are stored in a packed list. Also stored is an address array of offsets for locating particular meaningful metrics in the list, the address array being accessed by the corresponding frame and state indices. Also stored is an array for distinguishing meaningful and non-meaningful metrics. Accordingly, an input utterance can be evaluated by locating meaningful metrics in the packed list using the address array and by utilizing a default value for any non-meaningful metric.