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Thomas Roger Gaborski

age ~44

from Henrietta, NY

Also known as:
  • Thomas R Gaborski
  • Tom R Gaborski
Phone and address:
19 Portofino Cir, Henrietta, NY 14467
585 233-0693

Thomas Gaborski Phones & Addresses

  • 19 Portofino Cir, Henrietta, NY 14467 • 585 233-0693
  • West Henrietta, NY
  • 83 Tarrytown Rd, Rochester, NY 14618
  • 30 Cambric Cir, Pittsford, NY 14534 • 585 586-5806
  • Ithaca, NY
  • Buffalo, NY

Work

  • Position:
    Construction and Extraction Occupations

Education

  • Degree:
    High school graduate or higher
Name / Title
Company / Classification
Phones & Addresses
Thomas R Gaborski
President
SiMPore
Nanotechnology · Mfg Lab Apparatus/Furniture
150 Lucius Gordon Dr SUITE 121, West Henrietta, NY 14586
585 214-0585, 585 748-5980

Us Patents

  • Cell Culture Devices Having Ultrathin Porous Membrane And Uses Thereof

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  • US Patent:
    8119394, Feb 21, 2012
  • Filed:
    Mar 14, 2007
  • Appl. No.:
    11/686196
  • Inventors:
    James L. McGrath - Fairport NY, US
    Thomas R. Gaborski - Pittsford NY, US
    Christopher C. Striemer - Rochester NY, US
    Philippe M. Fauchet - Pittsford NY, US
  • Assignee:
    University of Rochester - Rochester NY
  • International Classification:
    C12M 3/06
    C12M 1/34
  • US Classification:
    4352971, 435 30, 435401, 4352885, 4352887, 4352975
  • Abstract:
    Disclosed is a device for co-culturing two or more populations of cells using ultrathin, porous membranes positioned between cell culture chambers. Multiple chamber devices and uses thereof are described, including the formation of in vitro tissue models for studying drug delivery, cell-cell interactions, and the activity of low abundance molecular species.
  • Ultrathin Porous Nanoscale Membranes, Methods Of Making, And Uses Thereof

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  • US Patent:
    8182590, May 22, 2012
  • Filed:
    May 1, 2006
  • Appl. No.:
    11/414991
  • Inventors:
    Christopher C. Striemer - Rochester NY, US
    Philippe M. Fauchet - Pittsford NY, US
    Thomas R. Gaborski - Pittsford NY, US
    James L. McGrath - Fairport NY, US
  • Assignee:
    University of Rochester - Rochester NY
  • International Classification:
    B01D 53/22
    B01D 39/00
    B01D 39/14
    B01D 71/04
  • US Classification:
    96 4, 96 5, 96 6, 96 7, 96 8, 96 9, 96 10, 96 11, 96 12, 96 13, 96 14, 96 54, 96 55, 96 56, 21050021, 21050025, 21050027, 210640
  • Abstract:
    A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
  • Ultrathin Porous Nanoscale Membranes, Methods Of Making, And Uses Thereof

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  • US Patent:
    8518276, Aug 27, 2013
  • Filed:
    Apr 20, 2012
  • Appl. No.:
    13/452453
  • Inventors:
    Christopher C. Striemer - Rochester NY, US
    Philippe M. Fauchet - Pittsford NY, US
    Thomas R. Gaborski - Pittsford NY, US
    James L. McGrath - Fairport NY, US
  • Assignee:
    University of Rochester - Rochester NY
  • International Classification:
    C23F 1/00
    C03C 15/00
  • US Classification:
    216 2, 216 41, 977778, 977781, 977890
  • Abstract:
    A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
  • Nanofabrication Using Actin Filaments

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  • US Patent:
    20050106629, May 19, 2005
  • Filed:
    Aug 26, 2004
  • Appl. No.:
    10/928478
  • Inventors:
    James McGrath - Fairport NY, US
    Ian Schwartz - Deansboro NY, US
    Michael Bindschadler - Rochester NY, US
    Morton Ehrenberg - Rochester NY, US
    Thomas Gaborski - Rochester NY, US
  • Assignee:
    University of Rochester - Rochester NY
  • International Classification:
    G01N033/53
    C12Q001/42
    C12N009/00
  • US Classification:
    435007100, 435183000
  • Abstract:
    The invention provides methods and compositions for using actin for making micro- and nano-scale structures, including-masking of two-dimentsional surfaces and non-conductive three dimensional spacers.
  • Methods For Facilitating Fluid Flow Through Nanoporous Membranes

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  • US Patent:
    20120171087, Jul 5, 2012
  • Filed:
    Oct 1, 2010
  • Appl. No.:
    13/496012
  • Inventors:
    Thomas R. Gaborski - Rochester NY, US
    James L. McGrath - Fairport NY, US
    Richard D. Richmond - Canandaigua NY, US
    Christopher C. Striemer - Rochester NY, US
  • Assignee:
    SIMPORE, INC. - West Henrietta NY
  • International Classification:
    B01L 3/00
    B01D 69/02
    F15D 1/00
    B82Y 40/00
    B82Y 30/00
    B82Y 99/00
  • US Classification:
    422533, 21050021, 137 1, 977780, 977902, 977840
  • Abstract:
    The present invention is drawn to methods for facilitating fluid flow through the nanopores of membranes, i.e., through sub-micron pores. The present invention is also directed to one or more apparatus for such fluid flow, and for nanoporous membranes modified to facilitate such fluid flow.
  • High-Performance, Low-Voltage Electroosmotic Pumps With Molecularly Thin Nanomembranes

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  • US Patent:
    20160115951, Apr 28, 2016
  • Filed:
    Oct 27, 2014
  • Appl. No.:
    14/524024
  • Inventors:
    - Rochester NY, US
    - West Henrietta NY, US
    Philippe Fauchet - Brentwood TN, US
    Thomas Gaborski - Rochester NY, US
    Christopher C. Striemer - Rochester NY, US
  • International Classification:
    F04B 43/04
  • Abstract:
    Thin pnc-Si membranes operate as high-flow-rate EOPs at low applied voltages. In at least some instances, this may be due to the small electrical resistance presented by the membrane and high electric fields across the molecularly thin membrane. The normalized flow rates of some pnc-Si EOPs may be 20 times to several orders of magnitude higher than other low-voltage EOPs.

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Thomas Gaborski

Lived:
Rochester, NY
Work:
Rochester Institute of Technology
Education:
Cornell University

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