James L. McGrath - Fairport NY, US Thomas R. Gaborski - Pittsford NY, US Christopher C. Striemer - Rochester NY, US Philippe M. Fauchet - Pittsford NY, US
Disclosed is a device for co-culturing two or more populations of cells using ultrathin, porous membranes positioned between cell culture chambers. Multiple chamber devices and uses thereof are described, including the formation of in vitro tissue models for studying drug delivery, cell-cell interactions, and the activity of low abundance molecular species.
Ultrathin Porous Nanoscale Membranes, Methods Of Making, And Uses Thereof
Christopher C. Striemer - Rochester NY, US Philippe M. Fauchet - Pittsford NY, US Thomas R. Gaborski - Pittsford NY, US James L. McGrath - Fairport NY, US
A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
Ultrathin Porous Nanoscale Membranes, Methods Of Making, And Uses Thereof
Christopher C. Striemer - Rochester NY, US Philippe M. Fauchet - Pittsford NY, US Thomas R. Gaborski - Pittsford NY, US James L. McGrath - Fairport NY, US
Assignee:
University of Rochester - Rochester NY
International Classification:
C23F 1/00 C03C 15/00
US Classification:
216 2, 216 41, 977778, 977781, 977890
Abstract:
A process for forming a porous nanoscale membrane is described. The process involves applying a nanoscale film to one side of a substrate, where the nanoscale film includes a semiconductor material; masking an opposite side of the substrate; etching the substrate, beginning from the masked opposite side of the substrate and continuing until a passage is formed through the substrate, thereby exposing the film on both sides thereof to form a membrane; and then simultaneously forming a plurality of randomly spaced pores in the membrane. The resulting porous nanoscale membranes, characterized by substantially smooth surfaces, high pore densities, and high aspect ratio dimensions, can be used in filtration devices, microfluidic devices, fuel cell membranes, and as electron microscopy substrates.
James McGrath - Fairport NY, US Ian Schwartz - Deansboro NY, US Michael Bindschadler - Rochester NY, US Morton Ehrenberg - Rochester NY, US Thomas Gaborski - Rochester NY, US
Assignee:
University of Rochester - Rochester NY
International Classification:
G01N033/53 C12Q001/42 C12N009/00
US Classification:
435007100, 435183000
Abstract:
The invention provides methods and compositions for using actin for making micro- and nano-scale structures, including-masking of two-dimentsional surfaces and non-conductive three dimensional spacers.
Methods For Facilitating Fluid Flow Through Nanoporous Membranes
Thomas R. Gaborski - Rochester NY, US James L. McGrath - Fairport NY, US Richard D. Richmond - Canandaigua NY, US Christopher C. Striemer - Rochester NY, US
The present invention is drawn to methods for facilitating fluid flow through the nanopores of membranes, i.e., through sub-micron pores. The present invention is also directed to one or more apparatus for such fluid flow, and for nanoporous membranes modified to facilitate such fluid flow.
High-Performance, Low-Voltage Electroosmotic Pumps With Molecularly Thin Nanomembranes
- Rochester NY, US - West Henrietta NY, US Philippe Fauchet - Brentwood TN, US Thomas Gaborski - Rochester NY, US Christopher C. Striemer - Rochester NY, US
International Classification:
F04B 43/04
Abstract:
Thin pnc-Si membranes operate as high-flow-rate EOPs at low applied voltages. In at least some instances, this may be due to the small electrical resistance presented by the membrane and high electric fields across the molecularly thin membrane. The normalized flow rates of some pnc-Si EOPs may be 20 times to several orders of magnitude higher than other low-voltage EOPs.