Tadanori Koga

age ~56

from Stony Brook, NY

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Also known as:

Connected to:

Selective Permeable Polymer Membrane For Gases
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US Patent:

20070260029, Nov 8, 2007
Filed:

Feb 27, 2007
Appl. No.:

11/711526
Inventors:

Tadanori Koga - Stony Brook NY, US
Miriam Rafailovich - Plainview NY, US
Etsushi Akashige - Port Jefferson Station NY, US
Assignee:

The Research Foundation of the State University of New York - Stoney Brook NY
International Classification:

C08F 112/08
US Classification:

526329700, 526347200, 096004000
Abstract:

Disclosed is a method and apparatus that contacts polymers with supercritical fluids in a density fluctuation ridge, producing selectively porous low-density regions impermeable to large molecule gases, for use in gas masks and respiratory processes.

Low Density, Low Dielectric, Metalizable Polymer Films
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US Patent:

20050234220, Oct 20, 2005
Filed:

Sep 2, 2004
Appl. No.:

10/933121
Inventors:

Tadanori Koga - Stony Brook NY, US
Miriam Rafailovich - Plainview NY, US
Benjamin Chu - Setauket NY, US
John Jerome - Stony Brook NY, US
International Classification:

C23C016/00
US Classification:

528481000
Abstract:

A method for forming a polymer film with improved physical properties and films formed by the method. The method includes contacting a polymer film with a supercritical fluid, preferably supercritical carbon dioxide or supercritical ethane, at high pressure and high temperature conditions which correspond to the density fluctuation ridge conditions of the supercritical fluid. The films formed by this method have a lower density, a reduced glass transition temperature, an increased nanoscale-porosity, a decreased dielectric constant and increased adhesion to a metallic layer.