Sydney George Dr Slater

US Patent:

6492092, Dec 10, 2002

Filed:

Mar 12, 1999

Appl. No.:

09/268429

Inventors:

Patrick Foster - Providence RI
Sydney George Slater - Cumberland RI
Andrew J. Blakeney - Seekonk MA
John Joseph Biafore - Providence RI

Assignee:

Arch Specialty Chemicals, Inc. - Norwalk CT

International Classification:

G03F 711

US Classification:

4302711, 430325, 430326, 525118

Abstract:

The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional epoxide as a crosslinking agent. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. In addition, the present invention also relates to a photolithographic coated substrate comprising: a substrate, the thermally cured undercoat composition on the substrate, and a radiation-sensitive resist topcoat on the thermally cured undercoat composition. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.

US Patent:

6783916, Aug 31, 2004

Filed:

Jul 9, 2001

Appl. No.:

09/901933

Inventors:

Patrick Foster - Providence RI
Sydney George Slater - Cumberland RI
Andrew J. Blakeney - Seekonk MA
John Joseph Biafore - Providence RI

Assignee:

Arch Specialty Chemicals, Inc. - Norwalk CT

International Classification:

G03F 726

US Classification:

4302701, 4302711, 430320, 430322, 430330, 4302811, 5253288, 525353, 525375, 428451, 428500

Abstract:

The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.

US Patent:

7217497, May 15, 2007

Filed:

Jun 8, 2004

Appl. No.:

10/863424

Inventors:

Patrick Foster - Providence RI, US
Sydney George Slater - Cumberland RI, US
Thomas Steinhäusler - Riverside RI, US
Andrew J. Blakeney - Seekonk MA, US
John Joseph Biafore - Providence RI, US

Assignee:

Arch Specialty Chemicals, Inc. - Norwalk CT

International Classification:

G03F 7/11

US Classification:

4302721, 4302811, 430322, 430330, 5253288, 525353, 525375

Abstract:

The present invention is directed to a thermally curable polymer composition, and a photolithographic substrate coated therewith, the composition comprising a hydroxyl-containing polymer, an amino cross-linking agent and a thermal acid generator. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography.

US Patent:

49026038, Feb 20, 1990

Filed:

Oct 5, 1987

Appl. No.:

7/104697

Inventors:

Sydney G. Slater - New Haven CT
Stanley A. Ficner - Durham CT

Assignee:

Olin Corporation - Cheshire CT

International Classification:

G03C 1495
G03C 176
G03C 194

US Classification:

430270

Abstract:

A light-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below: ##STR1## wherein R. sub. 1, R. sub. 2, R. sub. 3, R. sub. 4 and R. sub. 5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R. sub. 1 to R. sub. 5 groups are lower alkyl groups.

US Patent:

60542489, Apr 25, 2000

Filed:

Mar 12, 1999

Appl. No.:

9/268431

Inventors:

Patrick Foster - Providence RI
Sydney George Slater - Cumberland RI
Thomas Steinhausler - Riverside RI
Andrew J. Blakeney - Seekonk MA
John Joseph Biafore - Providence RI

Assignee:

Arch Specialty Chemicals, Inc. - Norwalk CT

International Classification:

G03C 176

US Classification:

4302711

Abstract:

The present invention is directed to a thermally curable polymer composition comprising a hydroxyl-containing polymer and a polyfunctional isocyanate as a crosslinking agent, which is particularly useful in photolithographic coating of substrates. The thermally curable polymer composition may be dissolved in a solvent and used as an undercoat layer in deep UV lithography. Furthermore, the present invention further relates to a process for using the photolithographic coated substrate for the production of relief structures.

US Patent:

52582604, Nov 2, 1993

Filed:

Nov 23, 1992

Appl. No.:

7/980076

Inventors:

Sydney G. Slater - New Haven CT
Stanley A. Ficner - Durham CT

Assignee:

Olin Corporation - Cheshire CT

International Classification:

G03C 1492

US Classification:

430272

Abstract:

A radiation-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) a photoactive benzennelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H. sub. 2.

US Patent:

52582655, Nov 2, 1993

Filed:

Nov 23, 1992

Appl. No.:

7/980057

Inventors:

Sydney G. Slater - New Haven CT
Stanley A. Ficner - Durham CT

Assignee:

Olin Corporation - Cheshire CT

International Classification:

G06C 500

US Classification:

430325

Abstract:

A radiation-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H. sub. 2.

US Patent:

51789876, Jan 12, 1993

Filed:

Apr 24, 1989

Appl. No.:

7/348754

Inventors:

Sydney G. Slater - New Haven CT
Stanley A. Ficner - Durham CT

Assignee:

Olin Corporation - Cheshire CT

International Classification:

G03C 1492
C08J 328

US Classification:

430270

Abstract:

A radiation-sensitive mixture useful as a negative-working photoresist composition comprising: (a) at least one novolak resin; and (b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or ##STR2##.