Sean J Bentley

US Patent:

20080174847, Jul 24, 2008

Filed:

Jun 15, 2007

Appl. No.:

11/763725

Inventors:

Sean J. Bentley - Farmingville NY, US

International Classification:

G02B 26/00
G02B 27/00

US Classification:

359237, 359577

Abstract:

According to one exemplary embodiment of the present invention, a method for writing an arbitrary, two-dimensional pattern using interferometric lithography and classical techniques includes the steps of: (1) creating a pixel array defined by a number of pixels having specific coordinates; (2) mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern; (3) controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern; and (4) controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel.