Scott M Detro

US Patent:

7035025, Apr 25, 2006

Filed:

May 28, 2003

Appl. No.:

10/447429

Inventors:

James B. Prince - Santa Clara CA, US
Scott M. Detro - Los Altos CA, US

Assignee:

Agilent Technologies, Inc. - Palo Alto CA

International Classification:

G02B 7/18

US Classification:

359831, 359822

Abstract:

Compact beam manipulators employ one or more Risley prism sets with or without a parallel plate translator. One beam manipulator contains a plate mounted to permit pitch and yaw adjustments and a prism set mounted to permit rotations. The rotations of the prisms adjust a beam direction, and adjustment of the plate adjusts the beam position. Another beam manipulator contains a prism set mounted to permit rotations and pitch and yaw adjustments of the prisms. The rotations and pitch and yaw adjustments provide coupled changes in the position and direction of a beam, and iterative adjustments alternate between rotating prisms to change the beam direction and the adjusting pitch and yaw to change the beam position. The iterative adjustments are complete when the beam has a target position and a target direction to within required tolerances. Gluing elements to optic holders minimizes stress-induced birefringence and temperature and humidity effects.

US Patent:

7319566, Jan 15, 2008

Filed:

Feb 17, 2006

Appl. No.:

11/356804

Inventors:

James B. Prince - Santa Clara CA, US
Scott M. Detro - Los Altos CA, US

Assignee:

Agilent Technologies, Inc. - Santa Clara CA

International Classification:

G02B 7/18

US Classification:

359831, 359822

Abstract:

Compact beam manipulators employ one or more Risley prism sets with or without a parallel plate translator. One beam manipulator contains a plate mounted to permit pitch and yaw adjustments and a prism set mounted to permit rotations. The rotations of the prisms adjust a beam direction, and adjustment of the plate adjusts the beam position. Another beam manipulator contains a prism set mounted to permit rotations and pitch and yaw adjustments of the prisms. The rotations and pitch and yaw adjustments provide coupled changes in the position and direction of a beam, and iterative adjustments alternate between rotating prisms to change the beam direction and the adjusting pitch and yaw to change the beam position. The iterative adjustments are complete when the beam has a target position and a target direction to within required tolerances. Gluing elements to optic holders minimizes stress-induced birefringence and temperature and humidity effects.

US Patent:

20070035846, Feb 15, 2007

Filed:

Aug 11, 2005

Appl. No.:

11/203014

Inventors:

Scott Detro - Los Altos CA, US
Greg Felix - San Jose CA, US

International Classification:

G02B 27/14

US Classification:

359634000

Abstract:

A frame, termed a prism frame, is attached to a processing face of a prism assembly and used to hold a position of a compensating waveplate and a microdisplay. The compensating waveplate includes adjustment tabs that allow precise positioning of an orientation of the waveplate (e.g., waveplate angle, rotation, etc) such that it is best positioned to compensate for items like residual retardation and/or skew rays that occur in the kernel. The precise position is varied depending on kernel design and other factors. A microdisplay frame is attached to a microdisplay package. The microdisplay frame is then precisely attached to the prism frame. The microdisplay can be removed from the kernel by sacrificing the inexpensive microdisplay frame.

US Patent:

47657413, Aug 23, 1988

Filed:

Mar 20, 1987

Appl. No.:

7/028527

Inventors:

Scott M. Detro - Sunnyvale CA
Alan H. Field - San Jose CA

Assignee:

Hewlett-Packard Company - Palo Alto CA

International Classification:

G01B 902

US Classification:

356358

Abstract:

A wavelength tracking compensator for a laser interferometer measurement system comprises a stable physical standard optical cavity and a double path, differential interferometer mounted on a baseplate. The interferometer monitors the apparent changes in the cavity's length caused by actual changes in the index of refraction of the surrounding air. The cavity is supported with a temperature compensated mount that utilizes the principle of differential thermal expansion of two different metals to create a mount which exactly matches the coefficient of expansion of the cavity material. A semi-kinematic mount supports the double path, differential interferometer and allows the interferometer to be accurately aligned to the cavity with three rotational degrees of freedom to prevent any cosine error in the cavity's optical path length measurement, to prevent polarization leakage, and to maximize optical power at the receiver. A phase measurement system interpolates between interference fringes to extend measurement resolution and provides absolute phase information relative to the fringes so that the measurement system can prevent measurement uncertainty caused by a beam interruption and recover from an interruption without re-initialization.