Satoshi Hamaguchi

US Patent:

55057802, Apr 9, 1996

Filed:

Mar 18, 1992

Appl. No.:

7/853363

Inventors:

Manoj Dalvie - Katonah NY
Satoshi Hamaguchi - White Plains NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

C23C 1654

US Classification:

118723MA

Abstract:

A high-density plasma-processing reactor with a processing chamber configuration which closes upon itself. The reactor applies a toroidal magnetic field to the plasma discharge which creates magnetic field lines which close upon themselves thereby preventing the magnetized plasma electrons traveling along these magnetic field lines from diffusing to the chamber wall or adjacent magnetic field lines. This electron confinement scheme is expected to result in a plasma density in the 10. sup. 12 to 10. sup. 13 cm. sup. -3 range. The high density plasma processing reactor includes a plasma processing chamber which forms an enclosed configuration mounted within a plurality of toroidal solenoid coils and containing a plurality of plasma source regions.