Ronald C Dykhuizen

US Patent:

6348687, Feb 19, 2002

Filed:

Sep 10, 1999

Appl. No.:

09/394185

Inventors:

John E. Brockmann - Albuquerque NM
John R. Torczynski - Albuquerque NM
Ronald C. Dykhuizen - Albuquerque NM
Richard A. Neiser - Albuquerque NM
Mark F. Smith - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

H01J 4104

US Classification:

250251, 250288, 436173

Abstract:

A new type of aerodynamic particle beam generator is disclosed. This generator produces a tightly focused beam of large material particles at velocities ranging from a few feet per second to supersonic speeds, depending on the exact configuration and operating conditions. Such generators are of particular interest for use in additive fabrication techniques.

US Patent:

61108448, Aug 29, 2000

Filed:

Sep 29, 1995

Appl. No.:

8/537192

Inventors:

Daniel J. Rader - Albuquerque NM
Ronald C. Dykhuizen - Albuquerque NM
Anthony S. Geller - Albuquerque NM

Assignee:

Sandia Corporation - Albuquerque NM

International Classification:

H01L 21302
H01L 21465

US Classification:

438795

Abstract:

A method of reducing particle deposition during the fabrication of microelectronic circuitry is presented. Reduction of particle deposition is accomplished by controlling the relative temperatures of various parts of the deposition system so that a large temperature gradient near the surface on which fabrication is taking place exists. This temperature gradient acts to repel particles from that surface, thereby producing cleaner surfaces, and thus obtaining higher yields from a given microelectronic fabrication process.