Sergey Velichko - Boise ID, US Jeffrey Nelson - Boise ID, US Roger Eagans - Nampa ID, US
International Classification:
H05B001/02
US Classification:
219/494000
Abstract:
A method and system for generating control settings for a multi-parameter control system. The interdependencies of processing tools and the related effect on semiconductor wafers within a processing tool is factored into a mathematical model that considers desired and measured wafer quality parameters in the derivation of specific solutions of sets of possible quality parameter adjustments. A selection process determines a set of adjustments such as one that results in minimal changes to the process.
Sergey Velichko - Boise ID, US Jeffrey Nelson - Boise ID, US Roger Eagans - Nampa ID, US
International Classification:
H05B 1/02
US Classification:
219494000
Abstract:
A method and system for generating control settings for a multi-parameter control system. The interdependencies of processing tools and the related effect on semiconductor wafers within a processing tool is factored into a mathematical model that considers desired and measured wafer quality parameters in the derivation of specific solutions of sets of possible quality parameter adjustments. A selection process determines a set of adjustments such as one that results in minimal changes to the process.