Robert E Jacques from El Cajon, CA, age 57

Robert L. Jacques

view source

Specialties:

General Surgery, Traumatic Surgery

Work:

Lakeland Regional Surgical Associates
130 Pablo St, Lakeland, FL 33803
863 687-1259 (phone), 863 284-1786 (fax)

Languages:

English
Spanish

Description:

Mr. Jacques works in Lakeland, FL and specializes in General Surgery and Traumatic Surgery. Mr. Jacques is affiliated with Lakeland Regional Health.

Srvp At Healthways

view source

Position:

SrVP at Healthways

Location:

Greater San Diego Area

Industry:

Health, Wellness and Fitness

Work:

Healthways
SrVP

Robert Jacques

view source

Location:

United States

Robert Jacques El Cajon, CA

view source

Work:

Submarine Learning Center

Apr 2012 to 2000
Course Manager/Program Manager USS Jefferson City

Sep 2007 to Apr 2012
Assistant Program Manager COMSUBLANT

Feb 2006 to Sep 2007
Assistant Program Manager Regional Emergency Action Plans
San Diego, CA
Feb 2003 to Feb 2006
Commander Submarine Squadron Eleven Staff

Education:

Excelsior College
Albany, NY
2014
Associate in applied science in Technology Electronic/Instrumentation Technologies GPA 4.0 Excelsior College
Albany, NY
2014
Bachelor's in Business Management Bachelor (In progress)

Skills:

Secret Clearance, Master Training Specialist, Independant, Time management, Leadership, Public Speaking, Instructor, Social perceptiveness,Communication, Attention to detail, Coaching, Mentorship

Us Patents

Control System For A Two Chamber Gas Discharge Laser
view source
US Patent:

7039086, May 2, 2006
Filed:

Jul 30, 2003
Appl. No.:

10/631349
Inventors:

John P. Fallon - Andover MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob Lipcon - Winchester MA, US
Richard L. Sandstrom - Encinitas CA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
Assignee:

Cymer, Inc. - San Diego CA
International Classification:

H01S 3/22
US Classification:

372 55, 372 57
Abstract:

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.

Control System For A Two Chamber Gas Discharge Laser
view source
US Patent:

7079564, Jul 18, 2006
Filed:

Jul 14, 2005
Appl. No.:

11/181258
Inventors:

John P. Fallon - Andover MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob P. Lipcon - Arlington MA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
Assignee:

Cymer, Inc. - San Diego CA
International Classification:

H01S 3/22
US Classification:

372 55
Abstract:

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.

High Repetition Rate Laser Produced Plasma Euv Light Source
view source
US Patent:

7087914, Aug 8, 2006
Filed:

Mar 17, 2004
Appl. No.:

10/803526
Inventors:

Robert P. Akins - Escondido CA, US
Richard L. Sandstrom - Encinitas CA, US
William N. Partlo - Poway CA, US
Igor V. Fomenkov - San Diego CA, US
John Martin Algots - San Diego CA, US
Robert N. Jacques - La Jolla CA, US
Frederick Palenschat - Lemon Grove CA, US
Jun Song - San Diego CA, US
Assignee:

Cymer, INC - San Diego CA
International Classification:

H01J 35/20
US Classification:

250504R, 2504931, 378119
Abstract:

An EUV light source apparatus and method are disclosed, which may comprise a pulsed laser providing laser pulses at a selected pulse repetition rate focused at a desired target ignition site; a target formation system providing discrete targets at a selected interval coordinated with the laser pulse repetition rate; a target steering system intermediate the target formation system and the desired target ignition site; and a target tracking system providing information about the movement of target between the target formation system and the target steering system, enabling the target steering system to direct the target to the desired target ignition site. The target tracking system may provide information enabling the creation of a laser firing control signal, and may comprise a droplet detector comprising a collimated light source directed to intersect a point on a projected delivery path of the target, having a respective oppositely disposed light detector detecting the passage of the target through the respective point, or a detector comprising a linear array of a plurality of photo-sensitive elements aligned to a coordinate axis, the light from the light source intersecting a projected delivery path of the target, at least one of the which may comprise a plane-intercept detection device. The droplet detectors may comprise a plurality of droplet detectors each operating at a different light frequency, or a camera having a field of view and a two dimensional array of pixels imaging the field of view. The apparatus and method may comprise an electrostatic plasma containment apparatus providing an electric plasma confinement field at or near a target ignition site at the time of ignition, with the target tracking system providing a signal enabling control of the electrostatic plasma containment apparatus.

Laser Output Light Pulse Beam Parameter Transient Correction System
view source
US Patent:

7116695, Oct 3, 2006
Filed:

Sep 28, 2004
Appl. No.:

10/953249
Inventors:

Robert N. Jacques - San Diego CA, US
Assignee:

Cymer, Inc. - San Diego CA
International Classification:

H01S 3/223
US Classification:

372 58, 372 55
Abstract:

An apparatus and method for producing laser output light pulses in bursts of pulses, at a selected pulse repetition rate, forming a laser output light beam, separated by an off time is disclosed, which may comprise a laser output light pulse beam parameter adjustment system, which may comprise a laser output light pulse beam parameter error detector providing a beam parameter error signal representative of the difference between the beam parameter and a selected target value for the beam parameter; a beam parameter adjustment mechanism; a beam parameter adjustment mechanism controller providing a beam parameter adjustment signal to the beam parameter adjustment mechanism based upon the value of the beam parameter error signal; a slow transient compensator providing a slow transient inversion signal modifying the beam parameter adjustment signal based upon the value of the beam parameter error signal. The apparatus and method may further comprise a beam parameter error scaling mechanism providing a normalized beam parameter error signal determined from the value of the beam parameter error signal; and the beam parameter adjustment mechanism controller and the slow transient controller providing, respectively, the beam parameter adjustment signal and the slow transient inversion signal based upon the normalized beam parameter error signal. The beam parameter adjustment mechanism controller may provide the beam parameter adjustment signal based upon a controller function that minimizes the average actual wavelength error or a windowed standard deviation of the actual wavelength error.

Euv Light Source
view source
US Patent:

7164144, Jan 16, 2007
Filed:

Jul 27, 2004
Appl. No.:

10/900839
Inventors:

William N. Partlo - Poway CA, US
Norbert Bowering - San Diego CA, US
Alexander I. Ershov - San Diego CA, US
Igor V. Fomenkov - San Diego CA, US
David W. Myers - Poway CA, US
Ian Roger Oliver - San Diego CA, US
John Viatella - San Diego CA, US
Robert N. Jacques - La Jolla CA, US
Assignee:

Cymer Inc. - San Diego CA
International Classification:

H01J 35/20
US Classification:

250504R, 2504931, 378119
Abstract:

A laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprises a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, and a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site.

Control System For A Two Chamber Gas Discharge Laser
view source
US Patent:

7596164, Sep 29, 2009
Filed:

Mar 15, 2006
Appl. No.:

11/376364
Inventors:

John P. Fallon - Andover MA, US
John A. Rule - Hingham MA, US
Robert N. Jacques - San Diego CA, US
Jacob P. Lipcon - Arlington MA, US
William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
Toshihiko Ishihara - San Diego CA, US
John Meisner - San Diego CA, US
Richard M. Ness - San Diego CA, US
Paul C. Melcher - El Cajon CA, US
Assignee:

Cymer, Inc. - San Diego CA
International Classification:

H01S 3/223
US Classification:

372 57, 372 55
Abstract:

The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) Finjection controls with novel learning algorithm.

Method And Apparatus For Gas Discharge Laser Bandwidth And Center Wavelength Control
view source
US Patent:

7643522, Jan 5, 2010
Filed:

Oct 20, 2005
Appl. No.:

11/254282
Inventors:

Fedor B. Trintchouk - San Diego CA, US
Robert N. Jacques - San Diego CA, US
Assignee:

Cymer, Inc. - San Diego CA
International Classification:

H01S 3/10
H01S 3/13
H01S 3/00
H01S 3/04
H01S 3/22
H01S 3/223
H01S 3/08
US Classification:

372 2902, 372 25, 372 2901, 372 29011, 372 29016, 372 29023, 372 32, 372 33, 372 34, 372 381, 372 3801, 372 3802, 372 3809, 372 55, 372 98, 372 99, 372102
Abstract:

A gas discharge laser system bandwidth control mechanism and method of operation for controlling bandwidth in a laser output light pulse generated in the gas discharge laser system is disclosed which may comprise a bandwidth controller which may comprise an active bandwidth adjustment mechanism; a controller actively controlling the active bandwidth adjustment mechanism utilizing an algorithm implementing bandwidth thermal transient correction based upon a model of the impact of laser system operation on the wavefront of the laser light pulse being generated and line narrowed in the laser system as it is incident on the bandwidth adjustment mechanism. The controller algorithm may comprises a function of the power deposition history in at least a portion of an optical train of the gas discharge laser system, e. g. , a linear function, e. g. , a combination of a plurality of decay functions each comprising a respective decay time constant and a respective coefficient.

Immersion Lithography Laser Light Source With Pulse Stretcher
view source
US Patent:

7643528, Jan 5, 2010
Filed:

Oct 10, 2007
Appl. No.:

11/973671
Inventors:

William N. Partlo - Poway CA, US
Alexander I. Ershov - San Diego CA, US
German Rylov - Poway CA, US
Igor V. Fomenkov - San Diego CA, US
Daniel J. W. Brown - San Diego CA, US
Christian J. Wittak - San Diego CA, US
Rajasekhar M. Rao - San Diego CA, US
Robert A. Bergstedt - Carlsbad CA, US
John Fitzgerald - San Diego CA, US
Richard L. Sandstrom - Encinitas CA, US
Vladimir B. Fleurov - Escondido CA, US
Robert N. Jacques - San Diego CA, US
Ed Danielewicz - Carlsbad CA, US
Robin Swain - Trabuco Canyon CA, US
Edward Arriola - Huntington Beach CA, US
Michael Wyatt - Santa Margarita CA, US
Walter Crosby - Los Alamitos CA, US
Assignee:

Cymer, Inc. - San Diego CA
International Classification:

H01S 3/22
US Classification:

372 55, 372 56, 372 57
Abstract:

An apparatus and method which may comprise a pulsed gas discharge laser which may comprise a seed laser portion; an amplifier portion receiving the seed laser output and amplifying the optical intensity of each seed pulse; a pulse stretcher which may comprise: a first beam splitter operatively connected with the first delay path and a second pulse stretcher operatively connected with the second delay path; a first optical delay path tower containing the first beam splitter; a second optical delay path tower containing the second beam splitter; one of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors located in the first tower and in the second tower; the other of the first and second optical delay paths may comprise: a plurality of mirrors defining the respective optical delay path including mirrors only in one of the first tower and the second tower.