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Richard M Schroedl

age ~65

from Staatsburg, NY

Also known as:
  • Rick M Schroedl
  • Dick M Schroedl
  • Rich Schroedl
  • Richard M Schroedle
  • Richar Schroedl
  • Schroedl Rich
  • Schroedl Richar
Phone and address:
63 Connelly Dr, Staatsburg, NY 12580
845 889-3138

Richard Schroedl Phones & Addresses

  • 63 Connelly Dr, Staatsburg, NY 12580 • 845 889-3138
  • Port Reading, NJ
  • Wappingers Falls, NY
  • Carteret, NJ
  • 63 Connelly Dr, Staatsburg, NY 12580

Work

  • Company:
    Lenovo
    Oct 2014
  • Position:
    Senior engineer - technical program manager

Education

  • Degree:
    Masters
  • School / High School:
    The George Washington University
    1999
  • Specialities:
    Project Management

Skills

Operations Management • Cross Functional Team Leadership • Process Improvement • Project Management • Data Center • Manufacturing Operations Management • Process Engineering • Sap • Program Management • Cloud Computing • Client Relationships Strengthening • Supply Chain Management • High Performance Computing • Chemical Engineering • Business Transformation • Integration • Six Sigma • Agile and Waterfall Methodologies • Engineering Management • Engineering • Manufacturing • Enterprise Software • Virtualization

Industries

Information Technology And Services

Us Patents

  • Stencil Mask With Channels Including Depressions

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  • US Patent:
    60950412, Aug 1, 2000
  • Filed:
    Jul 22, 1999
  • Appl. No.:
    9/359289
  • Inventors:
    Thomas Comino - Vestal NY
    Richard M. Schroedl - Staatsburg NY
  • Assignee:
    International Business Corporation - Armonk NY
  • International Classification:
    B05C 1706
    B41N 124
  • US Classification:
    101127
  • Abstract:
    The positioning of mesh side features in a stencil mask are controlled to produce a mask which possesses high structural integrity and which exhibits a low service life. Mesh side feature control also eliminates certain unnecessary design side channels and mesh side via openings. Mesh side feature placement at T-shaped design side junctions is also controlled to produce a more uniform distribution of material which is screened through the stencil mask.
  • Apparatus For Alignment Of Workpieces

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  • US Patent:
    52493431, Oct 5, 1993
  • Filed:
    Aug 23, 1991
  • Appl. No.:
    7/749033
  • Inventors:
    John A. Grosso - Staatsburg NY
    Reena G. Malangone - Charlotte NC
    John J. Masten - Poughkeepsie NY
    Richard M. Schroedl - Wappingers Falls NY
    Robert Stokrocki - Poughkeepsie NY
    Donald G. Will - Poughkeepsie NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    B25B 2714
    B25B 1100
  • US Classification:
    292814
  • Abstract:
    An apparatus is provided for positioning a workpiece with high accuracy and repeatably positioning the workpiece with similar accuracy while avoiding further manual alignment operations. Tapered pins, movable axially against a spring, are used to support a registration frame above the workpiece and allow attachment of the registration frame to the workpiece with high accuracy after initial manual positioning of the workpiece. After attachment of the registration frame to the workpiece, the use of similar, spring-loaded, tapered pins assures accuracy of positioning without further manual alignment. The axial motion of the pins is particularly advantageous during alignment of a plurality of workpieces in stacks and for processes requiring two-sided registration. During the alignment operation, a vacuum block is relatively movable on a base block and a workpiece immobilized on the vacuum block by a vacuum selectively applied to a portion thereof. When correct alignment has been achieved, the vacuum block is immobilized while the registration frame is attached by selective application of a vacuum to another portion of the vacuum block.
  • Visual Measurement Technique And Test Pattern For Aperture Offsets In Photoplotters

    view source
  • US Patent:
    53173384, May 31, 1994
  • Filed:
    Oct 29, 1991
  • Appl. No.:
    7/787305
  • Inventors:
    William I. Doxsey - Poughkeepsie NY
    John J. Masten - late of Poughkeepsie NY
    Richard M. Schroedl - Wappingers Falls NY
    Donald G. Will - Poughkeepsie NY
  • Assignee:
    International Business Machines Corporation - Armonk NY
  • International Classification:
    G01D 900
  • US Classification:
    346 11
  • Abstract:
    A test pattern including an aperture image and a line image including a plurality of parallel lines, forming a measurement graticule, overlapping the aperture image, permits determination of dimensions for correction of alignment of image centerlines by inspection rather than complex measurement with stationary optical instruments. Since the line pattern preferably includes a plurality of parallel lines of predetermined width and separated by a predetermined spacing, the line image can be made to overlie the aperture image without obscuring features of the aperture image which are significant to determination of the alignment correction dimension.

Resumes

Richard Schroedl Photo 1

Senior Engineer - Technical Program Manager

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Location:
2 Frazer Ave, Malvern, PA 19355
Industry:
Information Technology And Services
Work:
Lenovo
Senior Engineer - Technical Program Manager

Ibm May 2004 - Sep 2014
Senior Engineer

Ibm Dec 2001 - May 2004
Global Team Lead, Outsource Supply Chain Production Procurement

Ibm Sep 1995 - Dec 2001
Senior Engineer, Executive Technical Staff Microelectronics Division

Ibm Oct 1989 - Sep 1995
Development Engineering Manager
Education:
The George Washington University 1999
Masters, Project Management
Union College 1991
Master of Science, Masters, Computer Science
New Jersey Institute of Technology 1977 - 1982
Bachelors, Bachelor of Science, Chemical Engineering
Skills:
Operations Management
Cross Functional Team Leadership
Process Improvement
Project Management
Data Center
Manufacturing Operations Management
Process Engineering
Sap
Program Management
Cloud Computing
Client Relationships Strengthening
Supply Chain Management
High Performance Computing
Chemical Engineering
Business Transformation
Integration
Six Sigma
Agile and Waterfall Methodologies
Engineering Management
Engineering
Manufacturing
Enterprise Software
Virtualization

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