Philip C Layne

US Patent:

20200020508, Jan 16, 2020

Filed:

Mar 19, 2018

Appl. No.:

16/485519

Inventors:

- Gloucester MA, US
Philip Layne - Salem MA, US
James Alan Pixley - Dover NH, US

Assignee:

Varian Semiconductor Equipment Associates, Inc. - Gloucester MA

International Classification:

H01J 37/317
H01J 37/30

Abstract:

Provided herein are approaches for increasing surface area of a conductive beam optic by providing grooves or surface features thereon. In one approach, the conductive beam optic may be part of an electrostatic filter having a plurality of conductive beam optics disposed along an ion beam-line, wherein at least one conductive beam optic includes a plurality of grooves formed in an exterior surface. In some approaches, a power supply may be provided in communication with the plurality of conductive beam optics, wherein the power supply is configured to supply a voltage and a current to the plurality of conductive beam optics. The plurality of grooves may be provided in a spiral pattern along a length of the conductive beam optic, and/or oriented parallel to a lengthwise axis of the conductive beam optic.

US Patent:

20180342413, Nov 29, 2018

Filed:

May 25, 2017

Appl. No.:

15/605106

Inventors:

- Gloucester MA, US
Philip Layne - Salem MA, US
Keith A. Fernlund - Newburyport MA, US
Michael Swears - Beverly MA, US
Richard Allen Sprenkle - South Hamilton MA, US

Assignee:

Varian Semiconductor Equipment Associates, Inc. - Gloucester MA

International Classification:

H01L 21/68
H01L 21/687
H01L 21/67
H01L 21/02
H01L 21/48

Abstract:

Embodiments of the disclosure include a fixed position mask for workpiece edge treatment. In some embodiments, an apparatus includes a roplat having a rotatable assembly, and a platen coupled to the rotatable assembly, wherein the platen is configured to hold a workpiece. The apparatus further includes a bracket affixed to the rotatable assembly, and a mask directly coupled to the bracket, wherein the mask is positioned adjacent the workpiece. The mask covers an inner portion of the platen and the workpiece, leaving just an outer circumferential edge of the workpiece exposed to an ion treatment. In some embodiments, the platen is permitted to rotate relative to the bracket during an ion treatment. In some embodiments, the mask includes a solid plate section devoid of any openings, and a mounting portion extending from the plate section, wherein the mounting portion is directly coupled to an extension arm of the bracket.