Paul Nhan Tran

US Patent:

7590498, Sep 15, 2009

Filed:

Nov 30, 2007

Appl. No.:

11/948907

Inventors:

Sherk Chung - Emeryville CA, US
Mukund Chakravarthy Venkatesh - San Francisco CA, US
Paxton Ming Kai Chow - Walnut Creek CA, US
Jiuyi Cheng - Milpitas CA, US
Paul Tran - Sacramento CA, US
Joseph Raymond Monkowski - Danville CA, US

Assignee:

Pivotal Systems Corporation - Pleasanton CA

International Classification:

G01F 17/00

US Classification:

702 51

Abstract:

Leaks in a processing chamber, including “virtual leaks” resulting from outgassing of material present within the chamber, may be detected utilizing an optical emission spectroscopy (OES) sensor configured to monitor light emitted from plasma of a sample from the chamber. According to certain embodiments, gas introduced into the chamber by the leak may be detected directly on the basis of its optical spectrum. Alternatively, gas introduced by the leak may be detected indirectly, based upon an optical spectrum of a material resulting from reaction of the gas attributable to the leak. According to one embodiment, data from the OES sensor is received by a processor that is configured to compute a leak detection index. The value of the leak detection index is compared against a threshold to determine if a leak is detected. If the value of the index crosses the threshold, a notification of the existence of a leak is sent.

US Patent:

7937232, May 3, 2011

Filed:

Jun 25, 2007

Appl. No.:

11/821810

Inventors:

Paxton Ming Kai Chow - Walnut Creek CA, US
Vera Alexandrova Snowball - Newark CA, US
Sophia Leonidovna Shtilman - Sunnyvale CA, US
Chalee Asavathiratham - New York NY, US
Abhijit Majumdar - Pleasanton CA, US
Sherk Chung - San Francisco CA, US
Yi Wang - Foster City CA, US
Paul Tran - Sacramento CA, US

Assignee:

Pivotal Systems Corporation - Pleasanton CA

International Classification:

G01R 29/02

US Classification:

702 79, 702 89, 702125, 702176, 713400, 713500

Abstract:

Embodiments of the present invention relate to managing timestamps associated with received data. According to one embodiment, data is collected from a device that generates data at a specified rate, but which lacks a built-in clock. An accurate timestamp is assigned to the data by first taking an absolute timestamp from a reference clock, and then adding a calculated amount of time to each subsequent data point based on an estimate of the sampling frequency of the device. As the generated timestamp drifts from the actual reference clock time, the sampling frequency is re-estimated based on the amount of detected drift.

US Patent:

8265888, Sep 11, 2012

Filed:

Dec 9, 2009

Appl. No.:

12/634629

Inventors:

Sherk Chung - Piedmont CA, US
James MacAllen Chalmers - Danville CA, US
Jialing Chen - San Jose CA, US
Yi Wang - Foster City CA, US
Paul Tran - Sacramento CA, US
Sophia Leonidovna Shtilman - Sunnyvale CA, US
Joseph R. Monkowski - Danville CA, US

Assignee:

Pivotal Systems Corporation - Pleasanton CA

International Classification:

G01F 1/34

US Classification:

702 47, 73 105, 137 2, 702 50, 702 79

Abstract:

An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.

US Patent:

8271210, Sep 18, 2012

Filed:

Dec 9, 2009

Appl. No.:

12/634568

Inventors:

Sherk Chung - Piedmont CA, US
James MacAllen Chalmers - Danville CA, US
Jialing Chen - San Jose CA, US
Yi Wang - Foster City CA, US
Paul Tran - Sacramento CA, US
Sophia Leonidovna Shtilman - Sunnyvale CA, US
Joseph R. Monkowski - Danville CA, US

Assignee:

Pivotal Systems Corporation - Pleasanton CA

International Classification:

G06F 1/34

US Classification:

702 47, 73 105, 137 2, 702 50, 702 64

Abstract:

An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.

US Patent:

8271211, Sep 18, 2012

Filed:

Dec 9, 2009

Appl. No.:

12/634593

Inventors:

Sherk Chung - Piedmont CA, US
James MacAllen Chalmers - Danville CA, US
Jialing Chen - San Jose CA, US
Yi Wang - Foster City CA, US
Paul Tran - Sacramento CA, US
Sophia Leonidovna Shtilman - Sunnyvale CA, US
Joseph R. Monkowski - Danville CA, US

Assignee:

Pivotal Systems Corporation - Pleasanton CA

International Classification:

G01F 1/34

US Classification:

702 47, 73 105, 137 2, 702 50, 702100

Abstract:

An in-situ gas flow measurement controller measures the temperature and rate of pressure drop upstream from a flow control device (FCD). The controller samples the pressure and temperature data and applies the equivalent of a decimating filter to the data to produce filtered data at a slower sampling rate. The controller derives timestamps by counting ticks from the sampling clock of the A/D converter that is sampling the pressure at regular intervals to ensure the timestamps associated with the pressure samples are accurate and do not contain jitter that is associated with software clocks. The controller additionally normalizes the temperature reading to account for power supply fluctuations, filters out noise from the pressure and temperature readings, and excludes data during periods of instability. It calculates the gas flow rate accounting for possible non-linearities in the pressure measurements, and provides the computed gas flow measurement via one of many possible interfaces.