Pankaj Ramnani

US Patent:

20190352777, Nov 21, 2019

Filed:

May 17, 2018

Appl. No.:

15/982913

Inventors:

- Fremont CA, US
Jeffrey D. Womack - Lake Oswego OR, US
Meliha Gozde Rainville - Lake Oswego OR, US
Emile C. Draper - Molalla OR, US
Pankaj G. Ramnani - Tigard OR, US
Feng Bi - Cupertino CA, US
Pengyi Zhang - Tigard OR, US
Elham Mohimi - Hillsboro OR, US
Kapu Sirish Reddy - Portland OR, US

International Classification:

C23C 16/455
H01L 21/02

Abstract:

Showerheads for independently delivering different, mutually-reactive process gases to a wafer processing space are provided. The showerheads include a first gas distributor that has multiple plenum structures that are separated from one another by a gap, as well as a second gas distributor positioned above the first gas distributor. Isolation gas from the second gas distributor may be flowed down onto the first gas distributor and through the gaps in between the plenum structures of the first gas distributor, thereby establishing an isolation gas curtain that prevents the process gases released from each plenum structure from parasitically depositing on the plenum structures that provide other gases.