Nanette R Avila

US Patent:

44092032, Oct 11, 1983

Filed:

May 13, 1982

Appl. No.:

6/377620

Inventors:

Harry W. Gordon - New York NY
Nanette R. Avila - New York NY

Assignee:

Del Laboratories, Inc. - Farmingdale NY

International Classification:

A61K 704

US Classification:

424 61

Abstract:

A nail polish that does not contain as a film-forming ingredient a potentially explosive nitrocellulose film former, and furthermore it does not contain formaldehyde or formaldehyde resin as a hardener which embrittles and dries the nails, and is non-allergenic and non-yellowing. The new nail polish contains ethyl methacrylate homopolymer of a molecular weight of approximately 25,000 as the film-forming ingredient, and includes as necessary modifiers cellulose acetate propionate of a viscosity of approximately 20 seconds (ASTM method D-1343), acetyl tributyl citrate, a mixture of sucrose esters and, optionally, camphor. In addition, the new nail polish contains organic volatile solvents and is essentially water free. It also may contain other additives commonly employed in nail polishes such as polyamide resins, thickeners, pearlescents, pigments, U. V. absorbers and fragrances.