Michelle L Sanpedro

US Patent:

20220328285, Oct 13, 2022

Filed:

Oct 7, 2021

Appl. No.:

17/496427

Inventors:

- Santa Clara CA, US
William John DURAND - Oakland CA, US
Xinyuan CHONG - Milpitas CA, US
Kenric CHOI - San Jose CA, US
Weize HU - Sunnyvale CA, US
Kelvin CHAN - San Ramon CA, US
Amir BAYATI - San Jose CA, US
Michelle SANPEDRO - Mountain View CA, US
Philip A. KRAUS - San Jose CA, US
Adolph Miller ALLEN - Oakland CA, US

International Classification:

H01J 37/32
G01N 21/3504
G01N 33/00
C23C 16/455
C23C 16/52

Abstract:

Methods and apparatus for processing a substrate are provided herein. For example, a gas supply configured for use with a processing chamber includes an ampoule that stores a precursor and comprises an input to receive a carrier gas and an output to provide a mixture of the carrier gas and the precursor to the processing chamber and a sensor assembly comprising a detector and an infrared source operably connected to an outside of an enclosure, through which the mixture flows, and a gas measurement volume disposed within the enclosure and along an inner wall thereof so that a concentration of the precursor in the mixture can be measured by the detector and transmitted to a controller.