Maihan H Nguyen

US Patent:

20080062414, Mar 13, 2008

Filed:

Sep 13, 2006

Appl. No.:

11/520538

Inventors:

Xiaoming Chen - Austin TX, US
Maihan Nguyen - Austin TX, US
Osamu Arasaki - Austin TX, US
Tammy Maraquin - Austin TX, US
Daniel Sawyer - Pflugerville TX, US
Pedro Morrison - Austin TX, US

International Classification:

G01N 21/00

US Classification:

3562371

Abstract:

A method for haze control on a semiconductor reticle, the method including performing a reticle inspection of a semiconductor reticle to detect haze formation on a periodic basis, performing a wafer inspection to detect haze defects, forecasting haze formation, and cleaning the semiconductor reticle. Also included is a haze forecasting method for haze control on a semiconductor reticle, including scanning a plurality of semiconductor wafers, identifying repeating defects in the semiconductor wafers, storing the repeating defects in a database as known repeating defects, and identifying an additional repeating defect that is not a known repeating defect, the additional repeating defect caused by semiconductor reticle haze.