Mackenzie E King

US Patent:

6844196, Jan 18, 2005

Filed:

Dec 17, 2002

Appl. No.:

10/320875

Inventors:

Mackenzie E. King - Southbury CT, US
Cory Schomburg - Leander TX, US
Monica K. Hilgarth - Oxford CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

G01N 3300
G01N 2175
G01N 3320

US Classification:

436131, 422 61, 422 681, 422 81, 422 8205, 422 8209, 436 73, 436166, 436171

Abstract:

The present invention relates to antioxidant analysis for solder plating solutions, by using a complexing solution comprising a molybdenum compound, such as MoOCl, to form a highly colored antioxidant-molybdenum complex, which can be detected and analyzed by UV-Vis spectroscopic, as a basis for concentration determination for the antioxidant.

US Patent:

6897960, May 24, 2005

Filed:

May 2, 2002

Appl. No.:

10/138092

Inventors:

Frank DiMeo, Jr. - Danbury CT, US
Mackenzie E. King - Southbury CT, US

International Classification:

G01N021/00

US Classification:

356437, 436144, 436147, 422 83, 422 88, 73 3106

Abstract:

A hydrogen gas detector for detection of hydrogen gas in a gaseous environment. The detector comprises a light/heat source, an optical detector, and an optical barrier between the source and detector. The optical barrier responds to the presence of hydrogen by responsively changing from a first optical state to a different second optical state, whereby transmission of light from the light/heat source through the optical barrier is altered by the presence of hydrogen and the altered transmission is sensed by the optical detector to provide an indication of the presence of hydrogen gas in the gaseous environment.

US Patent:

6954560, Oct 11, 2005

Filed:

Dec 30, 2002

Appl. No.:

10/331396

Inventors:

Yuriy V. Tolmachev - Woodridge IL, US
Mackenzie King - Southbury CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

G02B006/00

US Classification:

385 12

Abstract:

The present invention relates to method and apparatus for determining concentrations of organic additives in metal plating solutions, based on infrared spectroscopy, and more specifically attenuated total reflection infrared spectroscopy (ATR-IR).

US Patent:

6984299, Jan 10, 2006

Filed:

Apr 27, 2004

Appl. No.:

10/833194

Inventors:

Jianwen Han - Danbury CT, US
Mackenzie E. King - Southbury CT, US

Assignee:

Advanced Technology Material, Inc. - Danbury CT

International Classification:

C25D 21/14

US Classification:

205 81, 205 83, 205101, 205296, 205787

Abstract:

The present invention relates to a method and apparatus for determining organic additive concentrations in a sample electrolytic solution, preferably a copper electroplating solution, by measuring the double layer capacitance of a measuring electrode in such sample solution. Specifically, the present invention utilizes the correlation between double layer capacitance and the organic additive concentration for concentration mapping, based on the double layer capacitance measured for the sample electrolytic solution.

US Patent:

7080545, Jul 25, 2006

Filed:

Oct 17, 2002

Appl. No.:

10/273036

Inventors:

Frank Dimeo, Jr. - Danbury CT, US
Philip S. H. Chen - Bethel CT, US
Jeffrey W. Neuner - Bethel CT, US
James Welch - New Fairfield CT, US
Michele Stawasz - Bethel CT, US
Thomas H. Baum - New Fairfield CT, US
Mackenzie E. King - Southbury CT, US
Jeffrey F. Roeder - Brookfield CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

G01N 9/00

US Classification:

73 3105, 73 232, 73 2501

Abstract:

A gas detector and process for detecting a fluorine-containing species in a gas containing same, e. g. , an effluent of a semiconductor processing tool undergoing etch cleaning with HF, NF, etc. The detector in a preferred structural arrangement employs a microelectromechanical system (MEMS)-based device structure and/or a free-standing metal element that functions as a sensing component and optionally as a heat source when elevated temperature sensing is required. The free-standing metal element can be fabricated directly onto a standard chip carrier/device package so that the package becomes a platform of the detector.

US Patent:

7094323, Aug 22, 2006

Filed:

Dec 17, 2002

Appl. No.:

10/320876

Inventors:

Mackenzie King - Southbury CT, US
John Staples - Buffalo Grove IL, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

G01N 27/413
G01N 27/416

US Classification:

204434, 204416, 205 81

Abstract:

The present invention relates to a process analyzer for analyzing composition of sample electrochemical deposition solutions, comprising at least one microelectrode having a radius of not more than about 5 μm. The process analyzer preferably comprises: (1) two or more independent analytical modules for analyzing fluid samples, (2) a primary manifold communicatively connected to the analytical modules for introducing fluid samples thereinto, and (3) a computational device communicatively associated with the analytical modules for colleting and processing analytical data therefrom, and therefore can be used to conduct automatic and simultaneous analysis of two or more sample solutions.

US Patent:

7141156, Nov 28, 2006

Filed:

Apr 27, 2004

Appl. No.:

10/833192

Inventors:

Jianwen Han - Danbury CT, US
Mackenzie E. King - Southbury CT, US
Glenn Tom - New Milford CT, US
Steven Lurcott - Sherman CT, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

G01N 27/26

US Classification:

205775, 702 23, 702 65, 702 85, 73 103

Abstract:

The present invention relates to a method for mathematically re-calibrating and adjusting an initial concentration analysis model that suffers from electrochemical measurement errors caused by surface state changes in the working/counter/reference electrode after extended usage. Specifically, such recalibration method reimburses long-term drift in the electrochemical measurements based on a single point testing.

US Patent:

7157051, Jan 2, 2007

Filed:

Sep 10, 2003

Appl. No.:

10/658948

Inventors:

Mackenzie E. King - Southbury CT, US
Thomas Chatterton - Cedar Park TX, US
Richard Bhella - Gilbert AZ, US

Assignee:

Advanced Technology Materials, Inc. - Danbury CT

International Classification:

G01N 31/00

US Classification:

422 681, 422 81, 422 8201, 422 8205, 422 99, 422100, 422103

Abstract:

A method and system for analysis of additives in electrolysis plating solutions, using a flow management system that minimizes loss of plating solutions and decreases sampling time. The system includes at least one analysis chamber, a sampling duct connected to processing tool, a four-way valve positioned between the processing tool and the sampling duct, at least one carrier fluid duct connected to the analysis chamber, at least one actuatable multi-port valve that provides a transference platform between the sampling duct and the at least one carrier fluid duct, and a flow sensor connected to the sampling duct and positioned downstream from the at least one actuatable multi-port valve.