Lei Wan

US Patent:

20120107583, May 3, 2012

Filed:

Oct 29, 2010

Appl. No.:

12/916279

Inventors:

Shuaigang Xiao - Fremont CA, US
XiaoMin Yang - Livermore CA, US
Yuan Xu - Fremont CA, US
Lei Wan - Madison WI, US

International Classification:

B32B 3/10
G03F 7/20

US Classification:

428210, 430324, 4281951

Abstract:

Patterned substrates templates are provided, as well as methods comprising a combination of lithography and self-assembly techniques. The patterned substrates may comprise first and second patterns.

US Patent:

20180226096, Aug 9, 2018

Filed:

Apr 6, 2018

Appl. No.:

15/947095

Inventors:

- San Jose CA, US
NICHOLAS R. CONLEY - Union City CA, US
BRUCE A. GURNEY - San Jose CA, US
RICARDO RUIZ - Santa Clara CA, US
LEI WAN - San Jose CA, US
QING ZHU - San Jose CA, US

International Classification:

G11B 5/855
G11B 5/712
G11B 5/74
B05D 1/00
B82B 1/00
B82Y 10/00
B82Y 30/00

Abstract:

In one embodiment, a structure includes: a substrate; and a monolayer of nanoparticles positioned above the substrate, where the nanoparticles are each grafted to one or more oligomers and/or polymers, and where each of the polymers and/or oligomers includes at least a first functional group configured to bind to the nanoparticles. In another embodiment, a structure includes: a substrate; a structured layer positioned above the substrate, the structured layer comprising a plurality of nucleation regions and a plurality of non-nucleation regions; and a crystalline layer positioned above the structured layer, where the plurality of nucleation regions have a pitch in a range between about 5 nm to about 20 nm.

US Patent:

20160140991, May 19, 2016

Filed:

Nov 18, 2014

Appl. No.:

14/547098

Inventors:

- Amsterdam, NL
Nicholas R. Conley - Redwood City CA, US
Bruce A. Gurney - San Jose CA, US
Ricardo Ruiz - Santa Clara CA, US
Lei Wan - San Jose CA, US
Qing Zhu - San Jose CA, US

Assignee:

HGST Netherlands B.V. - Amsterdam

International Classification:

G11B 5/712

Abstract:

In one embodiment, a structure includes: a substrate; and a monolayer of nanoparticles positioned above the substrate, where the nanoparticles are each grafted to one or more oligomers and/or polymers, and where each of the polymers and/or oligomers includes at least a first functional group configured to bind to the nanoparticles. In another embodiment, a structure includes: a substrate; a structured layer positioned above the substrate, the structured layer comprising a plurality of nucleation regions and a plurality of non-nucleation regions; and a crystalline layer positioned above the structured layer, where the plurality of nucleation regions have a pitch in a range between about 5 nm to about 20 nm.

US Patent:

20160140994, May 19, 2016

Filed:

Nov 18, 2014

Appl. No.:

14/547093

Inventors:

- Amsterdam, NL
Nicholas R. Conley - Redwood City CA, US
Bruce A. Gurney - San Jose CA, US
Ricardo Ruiz - Santa Clara CA, US
Lei Wan - San Jose CA, US
Qing Zhu - San Jose CA, US

Assignee:

HGST Netherlands B.V. - Amsterdam

International Classification:

G11B 5/84

Abstract:

In one embodiment, a method includes: depositing a plurality of nanoparticles on a substrate; and forming a monolayer of the nanoparticles on the substrate via self-assembly, where each of the nanoparticles comprises a nanoparticle core grafted to one or more oligomers and/or polymers, where each of the polymers and/or oligomers includes at least a first functional group configured to bind to the nanoparticles. In another embodiment, a method includes: depositing a plurality of nanoparticles on a substrate; and forming a monolayer of the nanoparticles on the substrate via self-assembly, where the nanoparticles each comprise a nanoparticle core grafted to one or more oligomers and/or polymers, each of the polymers and/or oligomers including a first terminal functional group configured to bind to the nanoparticles, and an optional second terminal functional group configured to bind to the substrate, where the substrate comprises guiding features configured to direct the self-assembly of the nanoparticles.