Lars Haubold

US Patent:

20130045367, Feb 21, 2013

Filed:

Jul 13, 2012

Appl. No.:

13/548550

Inventors:

Hans-Joachim Scheibe - Dresden, DE
Thomas Schuelke - Brighton MI, US
Lars Haubold - East Lansing MI, US
Michael Becker - East Lansing MI, US
Yaran Mahmut - East Lansing MI, US

Assignee:

Fraunhofer USA, Inc. - Plymouth MI
Fraunhofer-Gesellschaft zur Foerderung der angewandten Forschung e.V. - Muenchen

International Classification:

B32B 3/30
B32B 7/02
C23C 14/32
B32B 9/04

US Classification:

428162, 428408, 428213, 428216, 20419238

Abstract:

A coating based on diamond-like is formed from a plurality of films of diamond-like carbon formed alternatingly over one another and in this respect a film in which no portion or only a much lower portion of doped fluorine is contained. A film in which fluorine or at least fluorine with a higher portion than the film arranged thereunder or thereabove are formed alternatingly over one another. The coating could be manufactured by using a target of pure carbon. Films are deposited on a surface of a substrate by means of a PVD process, with the portion of fluorine contained in doped form. Films are formed alternately being varied by varying a supplied volume flow of a fluorine/carbon compound or sulfur/fluorine compound as a precursor.

US Patent:

20090283516, Nov 19, 2009

Filed:

Mar 17, 2009

Appl. No.:

12/381794

Inventors:

Clayton R. DeCamillis - Raleigh NC, US
Lars Haubold - East Lansing MI, US
Richard C. Hazlehurst - Holly Springs NC, US
Jerry K. Wessel - St. Charles IL, US

International Classification:

H05B 6/70

US Classification:

219690

Abstract:

A microwave power supply includes a magnetron, a waveguide configured to carry microwave power from the magnetron to a selected load, and an adjustable impedance element connected to the waveguide at a location upstream from the magnetron. The power supply may further include provision for varying the filament voltage to the magnetron tube. In the associated method, the adjustable upstream impedance and the adjustable filament voltage may be combined (and may be adjusted iteratively) to achieve high Q output. The load may be an applicator cavity for processing selected materials. The invention is particularly suitable for high Q cavities, such as single mode cavities, where it is desirable to match the output of the microwave source to the characteristics of the cavity for efficient operation. The adjustable upstream impedance element represents an electrical characteristic that may be achieved through various physically adjustable devices such as a movable backwall, a sliding short, a stub tuner, or an adjustable iris.

US Patent:

20210147974, May 20, 2021

Filed:

Jun 7, 2018

Appl. No.:

16/620341

Inventors:

- East Lansing MI, US
Lars HAUBOLD - East Lansing MI, US
Qi Hua FAN - Okemos MI, US

Assignee:

Board of Trustees of Michigan State University - East Lansing MI
Fraunhofer USA - East Lansing MI

International Classification:

C23C 14/32
C23C 14/06
F02F 1/00

Abstract:

A magnetic-field-assisted plasma coating system and method are provided. In another aspect, a coating system employs a cathode with a linearly moveable magnetic field. A further aspect employs a workpiece as an anode within which is located an elongated cathode which internally coats a bore of the workpiece. Still another aspect of the present system and method employs an elongated and hollow cathode with at least one magnetic source therein. In yet another aspect, end caps or plates seal against one or more open ends of a workpiece bore to be coated, with a cathode inserted into the bore and a vacuum being created within the bore such that the workpiece itself defines at least a portion of a vacuum chamber.

US Patent:

20200303168, Sep 24, 2020

Filed:

Jun 19, 2019

Appl. No.:

16/642133

Inventors:

- East Lansing MI, US
Lars HAUBOLD - East Lansing MI, US
Michael PETZOLD - Flint MI, US

Assignee:

Board of Trustees of Michigan State University - East Lansing MI
Fraunhofer USA - East Lansing MI

International Classification:

H01J 37/32
H01J 37/08
H01J 37/34

Abstract:

A single beam plasma or ion source apparatus is provided. Another aspect employs an ion source including multiple magnets and magnetic shunts arranged in a generally E cross-sectional shape. A further aspect of an ion source includes magnets and/or magnetic shunts which create a magnetic flux with a central dip or outward undulation located in an open space within a plasma source. In another aspect, an ion source includes a removeable cap attached to an anode body which surrounds the magnets. Yet a further aspect provides a single beam plasma source which generates ions simultaneously with target sputtering and at the same internal pressure.

US Patent:

20170166753, Jun 15, 2017

Filed:

Feb 12, 2015

Appl. No.:

15/117728

Inventors:

- Grand Rapids MI, US
- Plymouth MI, US
Lars (nmn) Haubold - East Lansing MI, US
Thomas (nmn) Schuelke - Brighton MI, US

International Classification:

C09D 5/00
G02B 1/11
H01J 37/34
C09D 1/00
C23C 14/06
C23C 14/00

Abstract:

Fluorinated and hydrogenated diamond-like carbon (“DLC-FH”) that have unique optical properties differ as a class from the existing DLC art, whose refractive indices [n] are limited to rather high values above a lower threshold of 1.7, and can range up to about 2.7. The DLC-FH materials can achieve very low refractive indices at 550 nm wavelength. [n550], i.e., below 1.5, and especially demonstrated down to 1.3. Moreover, whereas the absorption for the existing DLC art, as quantified by the extinction coefficient [k] at a wavelength of 550 nm, [k550], is limited to about 0.04, our DLC-FH material can achieve [k550] below 0.01. Both of these attributes, i.e., low [n550] and low [k550) means that, for the first time, a carbon-based material as represented by the DLC-FH material, can be used for anti-reflection (AR) coating.