John F Thornton

US Patent:

41117824, Sep 5, 1978

Filed:

May 31, 1977

Appl. No.:

5/801766

Inventors:

Alan S. Penfold - Playa del Rey CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

C23C 1500

US Classification:

204298

Abstract:

A method and apparatus for providing a completely closed plasma trap in an r. f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures. Means are further disclosed for protecting various structural elements from undesired exposure to plasma, preventing conductive plating of insulators, due to undesired deposition of target material, and shielding the entire glow discharge system to prevent undesired r. f.

US Patent:

41326130, Jan 2, 1979

Filed:

May 31, 1977

Appl. No.:

5/801765

Inventors:

Alan S. Penfold - Playa del Rey CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

C23C 1500

US Classification:

204192R

Abstract:

A method and apparatus for providing a completely closed plasma trap in an r. f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures. Means are further disclosed for protecting various structural elements from undesired exposure to plasma, preventing conductive plating of insulators, due to undesired deposition of target material, and shielding the entire glow discharge system to prevent undesired r. f.

US Patent:

40413535, Aug 9, 1977

Filed:

Dec 23, 1974

Appl. No.:

5/535429

Inventors:

Alan S. Penfold - Playa del Rey CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

C23C 1500
H01J 1704
H01J 1714
H05R 4124

US Classification:

315267

Abstract:

A method and apparatus for providing a completely closed plasma trap in an r. f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures. Means are further disclosed for protecting various structural elements from undesired exposure to plasma, preventing conductive plating of insulators, due to undesired deposition of target material, and shielding the entire glow discharge system to prevent undesired r. f.

US Patent:

41326121, Jan 2, 1979

Filed:

May 31, 1977

Appl. No.:

5/802059

Inventors:

Alan S. Penfold - Playa del Rey CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

C23C 1500

US Classification:

204192R

Abstract:

A method and apparatus for providing a completely closed plasma trap in an r. f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling and making electrical contact with various of the electrode structures. Means are further disclosed for protecting various structural elements from undesired exposure to plasma, preventing conductive plating of insulators, due to undesired deposition of target material, and shielding the entire glow discharge system to prevent undesired r. f.

US Patent:

39951871, Nov 30, 1976

Filed:

Mar 3, 1975

Appl. No.:

5/554487

Inventors:

Alan S. Penfold - Playa del Ray CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

H01J 114
H01J 1906

US Classification:

313346R

Abstract:

There is disclosed herein an electrode type glow discharge apparatus, such as that used for sputtering material from a cathode to provide a coating or the like on materials such as a substrate or substrates. Several exemplary embodiments are disclosed involving various combinations of constructural features including a flanged or spool type cathode, anode placement with respect thereto, provision of internal and/or external magnetic fields with field lines close to and substantially parallel with the barrel of the cathode, insulator placement, efficient cooling for anode and cathode, and the like. Furthermore, the assembly is constructed in a manner such that the same can be readily disassembled for enabling change of cathode materials and for cleaning cooling fluid passageways of the cathode and anode. Embodiments are described wherein at least a portion of the cathode may be in the form of a continuously moving member, such as a wire. The various constructural features enable apparatus to be provided which can create stable and uniform plasmas confined and controlled volume while operating at relatively low pressures with relatively low operating voltages.

US Patent:

41265300, Nov 21, 1978

Filed:

Aug 4, 1977

Appl. No.:

5/821698

Inventors:

John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

C23C 1500

US Classification:

204192EC

Abstract:

Cathode sputtering apparatus and a related method for its use in sputter cleaning and bias sputtering operations, in which work-pieces to be sputter-cleaned are secured to a cathode assembly in a configuration lending itself to the utilization of plasma traps which are highly conducive to efficient sputtering. Two basic embodiments are disclosed. In one embodiment, the cathode assembly takes the form of a hollow cylinder with inwardly projecting end flanges, the work-pieces being mounted with their surfaces to be cleaned facing inwardly, and in the other embodiment it takes the form of a cylindrical post with outwardly projecting end flanges, with the surfaces to be cleaned facing outwardly. Also disclosed are related techniques for sputter coating work-pieces immediately following a sputter cleaning step.

US Patent:

41167945, Sep 26, 1978

Filed:

May 31, 1977

Appl. No.:

5/802060

Inventors:

Alan S. Penfold - Playa del Rey CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

C23C 1500

US Classification:

204192R

Abstract:

A method and apparatus for providing a completely closed plasma trap in an r. f. type glow discharge system to enable enhanced sputtering from a pair of electrodes so that substrates may be suitably coated. The electrode pairs may be post type, hollow or planar, in various shapes with and without end wings. All configurations utilize a cooperating magnetic field, provided by field coils external or internal to the electrodes, the magnetic field being shaped to define with the electrodes at least one plasma containing trap having axial symmetry imposed by the magnetic field and/or the electrode structure. The trap may be defined by the pair of electrodes acting in concert with each other and the magnetic field, one or more traps may be defined separately by each electrode and the magnetic field, or both types of traps may exist simultaneously in a hybrid situation. Means are also disclosed for mounting, centering, cooling, assembling, and making electrical contact with various of the electrode structures. Means are further disclosed for protecting various structural elements from undesired exposure to plasma, preventing conductive plating of insulators, due to undesired deposition of target material, and shielding the entire glow discharge system to prevent undesired r. f.

US Patent:

40314243, Jun 21, 1977

Filed:

Mar 3, 1975

Appl. No.:

5/554485

Inventors:

Alan S. Penfold - Playa del Rey CA
John A. Thornton - Los Angeles CA

Assignee:

Telic Corporation - Santa Monica CA

International Classification:

H01J 102
H01J 144
H01J 152
H01J 2122

US Classification:

313146

Abstract:

There is disclosed herein an electrode type glow discharge apparatus, such as that used for sputtering material from a cathode to provide a coating or the like on materials such as a substrate or substrates. Several exemplary embodiments are disclosed involving various combinations of constructural features including a flanged or spool type cathode, anode placement with respect thereto, provision of internal and/or external magnetic fields with field lines close to and substantially parallel with the barrel of the cathode, insulator placement, efficient cooling for anode and cathode, and the like. Furthermore, the assembly is constructed in a manner such that the same can be readily disassembled for enabling change of cathode materials and for cleaning cooling fluid passageways of the cathode and anode. Embodiments are described wherein at least a portion of the cathode may be in the form of a continuously moving member, such as a wire. The various constructural features enable apparatus to be provided which can create stable and uniform plasmas confined and controlled volume while operating at relatively low pressures with relatively low operating voltages.