Jerome J Kukor

US Patent:

6746180, Jun 8, 2004

Filed:

Jun 12, 2003

Appl. No.:

10/459899

Inventors:

Jerome J. Kukor - East Windsor NJ
Kyoungphile Nam - Seoul, KR

Assignee:

Rutgers, the State University of New Jersey - Piscataway NJ

International Classification:

B09C 110

US Classification:

40512875, 4051281, 40512815, 40512845, 588205, 210758

Abstract:

A method of treatment of a contaminated material contaminated with an organic compound. The method includes treating the contaminate with a chemical oxidation step and a bioremediation step. The chemical oxidation step includes treating the contaminate with the following: a transition metal in soluble form in combination with an isolated chelator of the transition metal, to form a transition metal:chelator complex; an oxidizing agent that provides a reactive free radical in the presence of the transition metal complex; and a buffering compound; the pH being maintained in a neutral range. The method of treatment further includes treating the contaminate with a microbial consortium including at least two species prior to or after the chemical oxidation step to enhance the remediation process.

US Patent:

7056061, Jun 6, 2006

Filed:

Mar 24, 2004

Appl. No.:

10/807834

Inventors:

Jerome J. Kukor - East Windsor NJ, US
Kyoungphile Nam - Seoul, KR

Assignee:

Rutgers, The State University of New Jersey - New Brunswick NJ

International Classification:

B09C 1/10
A26D 3/00
C02F 1/72

US Classification:

40512875, 4051281, 40512915, 40512845, 4352625, 588315, 588320, 588405, 210758

Abstract:

A method of treatment of a contaminated material contaminated with an organic compound. The method includes treating the contaminate with a bioremediation step followed by a chemical oxidation step. The bioremediation step includes contacting the contaminate with a microbial consortium under conditions suitable for the consortium to mediate solubilization or biodegradation of the organic compound or chemical oxidation products thereof. The subsequent chemical oxidation step includes treating the bioremediated contaminate with: a transition metal in soluble form; a chelator of the transition metal, to form a transition metal:chelator complex; an oxidizing agent that provides a reactive free radical in the presence of the transition metal complex; and a buffering compound to maintain the pH in a neutral range. The reactive free radical initiates a chemical reaction with the organic compound to produce reaction products of the organic compound.

US Patent:

20020034421, Mar 21, 2002

Filed:

May 23, 2001

Appl. No.:

09/863491

Inventors:

Jerome Kukor - East Windsor NJ, US
Kyoungphile Nam - Seoul, KR

Assignee:

Rutgers University

International Classification:

B09B001/00

US Classification:

405/128750, 405/128100

Abstract:

The invention provides a method of treatment of a contaminated material contaminated with an organic compound. The method includes the steps of treating the contaminate with a chemical oxidation step. The chemical oxidation step includes treating the contaminate with a transition metal in soluble form in combination with a chelator of the transition metal, to form a transition metal:chelator complex; and an oxidizing agent that provides a reactive free radical in the presence of the transition metal complex. The pH is maintained in a neutral range by a buffering compound. In particular embodiments, the method of treatment may further include pre-treating the contaminate with a biodegradation step prior to or after the chemical oxidation step. The biodegradation step includes a step of contacting the contaminate with a microbial consortium under conditions suitable for the consortium to mediate solubilization or biodegradion of the organic compound. The invention also provides kits and a general method for producing reactive free radicals in an aqueous medium by providing a transition metal:chelator complex; and an oxidizing agent that provides a reactive free radical in the presence of the transition metal complex; the pH being maintained in a neutral range by a buffering compound.