Douglas E. Ward - Santa Ana CA, US Jason A. Sherlock - Santa Ana CA, US
Assignee:
Saint-Gobain Ceramics & Plastics, Inc. - Worcester MA
International Classification:
C09K 13/00
US Classification:
252 791, 252 794, 51308, 216 88, 216 89, 438692
Abstract:
The disclosure is directed to a processing fluid including an aliphatic hydrocarbon component having an average chain length of 8 to 16 carbons and about 0. 0001 wt % to about 50. 0 wt % of a Lewis active component.
Douglas E. Ward - Santa Ana CA, US Jason A. Sherlock - Anaheim CA, US
Assignee:
Saint-Gobain Ceramics & Plastics, Inc. - Worcester MA
International Classification:
B24B 1/00
US Classification:
451 36, 451 41, 451 60, 252 791
Abstract:
The disclosure is directed to a processing fluid including at least 50 wt % of an aliphatic hydrocarbon having an average chain length of 8 to 16 carbons, 0. 005 wt % to 10. 0 wt % of Lewis active components, and not greater than 1. 0 wt % water. The Lewis active components includes a Lewis acid and a Lewis base. The processing fluid has a conductivity of at least 10 nS/m and a Cannon viscosity of about 0. 5 cp to about 5 cp at 25 C.
Aqueous Fluid Compositions For Abrasive Slurries, Methods Of Production, And Methods Of Use Thereof
Abhaya Bakshi - Westford MA, US Jason Sherlock - Anaheim CA, US
Assignee:
Saint-Gobain Ceramics & Plastics, Inc. - Worcester MA
International Classification:
B24B 1/00 C08J 5/14
US Classification:
451037000, 051298000
Abstract:
Aqueous slurry compositions for use in loose-abrasive machining processes, particularly aqueous abrasive slurries for use in wire saw processes. These aqueous slurry compositions comprise abrasive particles uniformly and stably dispersed in lubricant, which comprises a combination of a vehicle and water, particularly PEG and water.
Concentrated Abrasive Slurry Compositions, Methods Of Production, And Methods Of Use Thereof
Concentrated slurry compositions for use in loose-abrasive machining processes, particularly concentrated abrasive slurries for use in wire saw processes. These concentrated slurry compositions comprise abrasive particles uniformly and stably dispersed in a vehicle. The concentrated slurry compositions are easily converted to working slurry compositions by simple dilution and mixing with water and/or vehicle.
Composition And Method For Conducting A Material Removing Operation
A composition suitable for chemical mechanical polishing a substrate can comprise abrasive particles, a multi-valent metal borate, at least one oxidizer and a solvent. The composition can polish a substrate with a high material removal rate and a very smooth surface finish.
Composition And Method For Conducting A Material Removing Operation
A composition suitable for chemical mechanical polishing a substrate can comprise abrasive particles, a multi-valent metal borate, at least one oxidizer and a solvent. The composition can polish a substrate with a high material removal rate and a very smooth surface finish.
Fluid Composition And Method For Conducting A Material Removing Operation
- Worcester MA, US Jason A. Sherlock - Anaheim CA, US Long Huy Buil - Orange CA, US Douglas E. Ward - Santa Ana CA, US
International Classification:
C09G 1/18 C23F 3/04
Abstract:
A fluid composition suitable for chemical mechanical polishing a substrate can in include a multi-valent metal borate, at least one oxidizer, and a solvent. The fluid composition can be essentially free of abrasive particles and may achieve a high material removal rate and excellent surface finish.
Oxidizing Fluid For The Chemical-Mechanical Polishing Of Ceramic Materials
- Worcester MA, US Jason A. SHERLOCK - Anaheim CA, US Angela Wamina KWAPONG - Worcester MA, US
Assignee:
SAINT-GOBAIN CERAMICS & PLASTICS, INC. - Worcester MA
International Classification:
C09G 1/04 H01L 21/306
Abstract:
The present disclosure is directed to a fluid composition that can be used in chemical-mechanical polishing processes of inorganic material. The fluid composition can include at least one oxidizing agent and a multivalent cation component. Using the fluid composition during a chemical-mechanical polishing process can facilitate a relatively defect free material surface after polishing while achieving a suitable material removal rate.