Jasbir K Gill

US Patent:

6840251, Jan 11, 2005

Filed:

Apr 8, 2003

Appl. No.:

10/409220

Inventors:

Jasbir S. Gill - Naperville IL, US
Amit Gupta - Aurora IL, US

Assignee:

Nalco Company - Naperville IL

International Classification:

B08B 900

US Classification:

134 2212, 423477, 423478, 210749, 210753, 210754, 210755, 210756, 210764, 422 28, 422 32, 166311, 134 221, 134 2211, 134 2214, 134 2216, 134 2218, 134 2219, 134 26, 134 28, 134 29, 134 34, 134 36, 134 41

Abstract:

On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. An alternative method involves the use of a chelating agent and a biocide. Other possible cleaning and disinfection reagents may be added as needed including corrosion inhibitors, chelating agents, biocides, surfactants and reducing agents.

US Patent:

7252096, Aug 7, 2007

Filed:

Nov 30, 2004

Appl. No.:

11/000587

Inventors:

Jasbir S. Gill - Naperville IL, US
Amit Gupta - Aurora IL, US

Assignee:

Nalco Company - Naperville IL

International Classification:

B08B 9/00

US Classification:

134 2212, 423477, 423478, 210749, 210753, 210754, 210755, 422756, 422764, 422 28, 422 32, 166311, 134 221, 134 2211, 134 2214, 134 2216, 134 2218, 134 2219, 134 26, 134 28, 134 29, 134 34, 134 36, 134 41

Abstract:

On-Line and Off-Line methods of simultaneously cleaning and disinfecting an industrial water system are described and claimed. The methods involve the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. An alternative method involves the use of a chelating agent and a biocide. Other possible cleaning and disinfection reagents may be added as needed including corrosion inhibitors, chelating agents, biocides, surfactants and reducing agents.

US Patent:

8470238, Jun 25, 2013

Filed:

Nov 20, 2008

Appl. No.:

12/274606

Inventors:

Kaveh Sotoudeh - Naperville IL, US
Michael A. Kamrath - Aurora IL, US
Jasbir S. Gill - Naperville IL, US

Assignee:

Nalco Company - Naperville IL

International Classification:

C23F 11/00
C23F 11/04
C23F 11/06
C23F 11/10
C09K 15/18
C09K 15/20

US Classification:

422 16, 252390, 252391, 252392, 106 1416

Abstract:

Compositions and methods of using such compositions for reducing copper ion discharge from aqueous systems is disclosed and claimed. The composition includes a synergistic combination of at least two different benzotriazoles or salts thereof that effectively provides an erosion-resistant barrier on copper-containing surfaces of industrial systems.

US Patent:

20030203827, Oct 30, 2003

Filed:

Apr 30, 2002

Appl. No.:

10/135317

Inventors:

Andrew Cooper - Oswego IL, US
Jasbir Gill - Naperville IL, US
Amit Gupta - Aurora IL, US
Robert Kelly - Oswego IL, US
Douglas Kelley - Naperville IL, US
Eric Myers - Aurora IL, US

International Classification:

B08B009/00
C02F005/10
C23F014/02

US Classification:

510/247000, 134/028000, 134/022120, 134/022180, 134/041000, 134/036000, 510/252000

Abstract:

A method of simultaneously cleaning and disinfecting an industrial water system is described and claimed. The method involves the addition to the water of the industrial water system of a Compound selected from the group consisting of the alkali salts of chlorite and chlorate and mixtures thereof; and an acid, followed by allowing the water in the industrial water system to circulate for several hours. The reaction of the alkali salts of chlorite and chlorate and acid produces chlorine dioxide in-situ in the water of the industrial water system. The chlorine dioxide kills microorganisms and the acid acts to remove deposits upon the water-contact surfaces of the equipment. This cleaning and disinfecting method works in a variety of industrial water systems including cooling water systems.

US Patent:

20090101587, Apr 23, 2009

Filed:

Oct 22, 2007

Appl. No.:

11/876375

Inventors:

Peter Blokker - Heerhugowaard, NL
Jasbir S. Gill - Naperville IL, US
Paloma Lopez-Serrano - Delft, NL

International Classification:

C02F 5/10

US Classification:

210701

Abstract:

This invention relates to an improved method of inhibiting corrosion and calcium sulfate and calcium carbonate scaling in thermal and membrane desalination processes. The method includes adding a composition having an acrylic acid 2-acrylamido-2-methylpropyl sulfonic acid copolymer, optionally combined with an oligomeric phosphinosuccinic acid to seawater or recirculation brine in a desalting process to produce water for drinking and industrial applications. The method also includes adding a composition including mono, bis, and oligomeric phosphinosuccinic acid adducts to the desalting process.

US Patent:

20090294372, Dec 3, 2009

Filed:

May 30, 2008

Appl. No.:

12/130515

Inventors:

Jasbir S. Gill - Naperville IL, US
Daniel N.T. Hay - Naperville IL, US

International Classification:

C02F 5/08

US Classification:

210697, 210699

Abstract:

The current invention relates to the inhibition of scale deposits in an acidic slurry or solution. The current invention uses an aqueous synthetic mixture comprising a phosphate, phosphonate, anionic polymer, or combinations thereof in the slurry and/or solution to inhibit scale during the processing of ore. The production of scale in an acidic environment is difficult because of the acidic solution neutralizing most known inhibitors. The claimed invention has a significant decrease in the scale production allowing for reduced down time of systems for de-scaling procedures.

US Patent:

20090294373, Dec 3, 2009

Filed:

Feb 16, 2009

Appl. No.:

12/371674

Inventors:

Jasbir S. Gill - Naperville IL, US
Daniel N.T. Hay - Naperville IL, US

International Classification:

C02F 5/02
C02F 5/04
C02F 5/14
C02F 101/00

US Classification:

210697, 210696, 210699, 210701

Abstract:

The current invention relates to the inhibition of scale deposits in a slurry or solution under acidic conditions. The current invention uses an aqueous synthetic mixture comprising a phosphate, phosphonate, anionic polymer, or combinations thereof in the slurry and/or solution to inhibit scale deposition from acidic process streams. The control of scale under acidic conditions is difficult because the acidic environment renders most known inhibitors ineffective. The claimed invention causes a significant decrease in the scale generated allowing for reduced down time of systems for de-scaling procedures and thus increasing production.

US Patent:

20090294374, Dec 3, 2009

Filed:

Jun 2, 2008

Appl. No.:

12/131571

Inventors:

Jasbir S. Gill - Naperville IL, US
Srikanth Kidambi - Palatine IL, US
Frank Fun-Yuee Lu - Naperville IL, US
John D. Morris - Naperville IL, US

International Classification:

C02F 5/10
C02F 5/14

US Classification:

210699, 210698, 210701

Abstract:

A method for inhibiting the formation and deposition of silica and silicate compounds in water systems comprising adding to the water in the water system an effective inhibiting amount of one or more water-soluble polymers of formulawherein M is a repeating unit obtained after polymerization of one or more monomers comprising a polymerizable carbon-carbon double bond; r is 0 to about 5 mole percent, s is 100 to about 95 mole percent; Ris H or C-Calkyl; Ris a group of formula —(CH—CHR—O)—; Ris H or CH, or a mixture thereof; and n is 2 to about 25.