Hengpeng Wu from 85 Beechwood Cir, Millstone, NJ 08844, age 61

Modified Alginic Acid Of Alginic Acid Derivatives And Thermosetting Anti-Reflective Compositions Thereof
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US Patent:

7008476, Mar 7, 2006
Filed:

Jun 11, 2003
Appl. No.:

10/459229
Inventors:

Hengpeng Wu - Hillsborough NJ, US
Shuji Ding-Lee - Branchburg NJ, US
Jianhui Shan - Pennington NJ, US
Eleazar B. Gonzalez - Bloomfield NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

G03F 7/11
C08L 5/04
C08B 37/04
US Classification:

1061621, 536 3, 4302711, 525 543, 525 542, 516104
Abstract:

Modified alginic acid or alginic acid derivatives and anti-reflective coatings based on thereon are described.

Bottom Antireflective Coatings
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US Patent:

7030201, Apr 18, 2006
Filed:

Nov 26, 2003
Appl. No.:

10/721883
Inventors:

Huirong Yao - Plainsboro NJ, US
Shuji Ding-Lee - Branchburg NJ, US
Hengpeng Wu - Hillsborough NJ, US
Zhong Xiang - Somerset NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

C08F 126/06
C08F 226/06
C08F 122/40
C08F 4/44
C07C 321/00
US Classification:

526260, 526262, 526304, 525123, 5253267, 5253268, 5253271, 5253282, 540525, 546142, 546183, 546237, 546296, 544175, 548479, 548547, 564158, 564159, 564162
Abstract:

The present invention relates to bottom antireflective coating compositions and polymers useful in making such compositions.

Process For Making Polyesters
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US Patent:

7081511, Jul 25, 2006
Filed:

Apr 5, 2004
Appl. No.:

10/817987
Inventors:

Hengpeng Wu - Hillsborough NJ, US
Jianhui Shan - Pennington NJ, US
Shuji Sue Ding-Lee - Branchburg NJ, US
Eleazor B. Gonzalez - Bloomfield NJ, US
Mark O. Neisser - Whitehouse Station NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

C08G 63/00
US Classification:

528272, 4284111, 428480, 525480, 528271
Abstract:

The present invention relates to a process for making a polyester where a dianhydride is reacted with a diol. The resulting polyester can be further reacted with a compound selected from aromatic oxides, aliphatic oxides, alkylene carbonates, alcohols, and mixtures thereof.

Antireflective Compositions For Photoresists
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US Patent:

7264913, Sep 4, 2007
Filed:

Nov 21, 2002
Appl. No.:

10/301462
Inventors:

Hengpeng Wu - Hillsborough NJ, US
Shuji Ding-Lee - Branchburg NJ, US
Zhong Xiang - Somerset NJ, US
Joseph E. Oberlander - Phillipsburg NJ, US
Mark O. Neisser - Whitehouse Station NJ, US
Eleazar Gonzalez - Bloomfield NJ, US
Jainhui Shan - Pennington NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

G03C 1/825
G03C 1/74
G03F 7/20
G03F 7/30
G03F 7/36
US Classification:

4302701, 4302711, 430325, 430326, 430908, 430914, 430919, 430921, 430330
Abstract:

The present invention relates to a novel antireflective coating composition comprising a polymer, a crosslinking agent and an acid generator. The present invention further relates to a process for using the novel composition, particularly at 193 nm. The polymer of the present invention contains at least one unit selected from structures 1, 2 and 3,.

Antireflective Coating Compositions
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US Patent:

7666575, Feb 23, 2010
Filed:

Oct 18, 2006
Appl. No.:

11/550459
Inventors:

Hengpeng Wu - Hillsborough NJ, US
David Abdallah - Bernardsville NJ, US
Mark Neisser - Whitehouse Station NJ, US
PingHung Lu - Bridgewater NJ, US
Ruzhi Zhang - Pennington NJ, US
M. Dalil Rahman - Flemington NJ, US
Assignee:

AZ Electronic Materials USA Corp - Somerville NJ
International Classification:

G03F 7/09
G03F 7/11
G03F 7/30
US Classification:

4302711, 430326, 430325, 438952, 525219
Abstract:

The present invention relates to an antireflective coating composition comprising, (i) a thermal acid generator; (ii) a crosslinkable polymer comprising at least one aromatic group; and, (iii) a polymeric crosslinker comprising at least one unit of structure (6),.

Antireflective Compositions For Photoresists
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US Patent:

7691556, Apr 6, 2010
Filed:

Jun 22, 2005
Appl. No.:

11/159002
Inventors:

Hengpeng Wu - Hillsborough NJ, US
Shuji Ding-Lee - Branchburg NJ, US
Zhong Xiang - Edison NJ, US
Aritaka Hishida - Bedminster NJ, US
Jianhui Shan - Pennington NJ, US
Hong Zhuang - Raritan NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

G03F 7/00
G03F 7/004
US Classification:

4302701, 4302711, 430311, 430330
Abstract:

The present invention relates to a coating solution comprising a polymer obtained by reacting a glycoluril compound with at least one reactive compound containing at least one hydroxy group and/or at least one acid group, and further where the polymer is soluble in an organic solvent. The invention also relates to a process for imaging a photoresist coated over such a coating composition and to a polymer for the coating composition.

Positive-Working Photoimageable Bottom Antireflective Coating
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US Patent:

7824837, Nov 2, 2010
Filed:

Oct 22, 2007
Appl. No.:

11/876332
Inventors:

Hengpeng Wu - Hillsborough NJ, US
Mark O. Neisser - Whitehouse Station NJ, US
Shuji S Ding-Lee - Branchburg NJ, US
Aritaka Hishida - Bedminster NJ, US
Joseph E. Oberlander - Phillipsburg NJ, US
Medhat E. Toukhy - Flemington NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

G03F 7/095
G03F 7/039
G03F 7/11
US Classification:

4302701, 4302881, 4302711, 430914, 430311, 430326, 430330, 430327, 438952
Abstract:

The present invention relates to a positive bottom photoimageable antireflective coating composition which is capable of being developed in an aqueous alkaline developer, wherein the antireflective coating composition comprises a polymer comprising at least one recurring unit with a chromophore group and one recurring unit with a hydroxyl and/or a carboxyl group, a vinyl ether terminated crosslinking agent, and optionally, a photoacid generator and/or an acid and/or a thermal acid generator. The invention further relates to a process for using such a composition.

Solvent Mixtures For Antireflective Coating Compositions For Photoresists
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US Patent:

7824844, Nov 2, 2010
Filed:

Jan 19, 2007
Appl. No.:

11/624744
Inventors:

Zhong Xiang - Edison NJ, US
Hengpeng Wu - Hillsborough NJ, US
Hong Zhuang - Raritan NJ, US
Eleazar Gonzalez - Bloomfield NJ, US
Mark O. Neisser - Whitehouse Station NJ, US
Assignee:

AZ Electronic Materials USA Corp. - Somerville NJ
International Classification:

G03F 7/40
G03F 7/30
G03F 7/11
C08F 8/30
H01L 21/027
US Classification:

430325, 430326, 430330, 4302711, 4302721, 430313, 430323, 528259, 525154, 522111, 522164, 522166
Abstract:

The invention relates to an antireflective coating composition capable of being coated beneath a photoresist layer, where the antireflective coating composition comprises a polymeric crosslinker and a solvent mixture, where the solvent mixture comprises at least one primary organic solvent and at least one secondary organic solvent selected from any of structures 1, 2 and 3,.

Hengpeng Wu