George J Giuffre

US Patent:

51694883, Dec 8, 1992

Filed:

May 23, 1991

Appl. No.:

7/704884

Inventors:

George J. Giuffre - Wappingers Falls NY
Maris A. Sturans - Poughguag NY
James F. White - Newburgh NY
Robert R. Wilbarg - Hopewell Junction NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01L 21306
B44C 122
C23F 100
C03C 1500

US Classification:

156643

Abstract:

An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.

US Patent:

47376449, Apr 12, 1988

Filed:

Oct 30, 1985

Appl. No.:

6/793046

Inventors:

Douglas G. Cullum - Wappingers Falls NY
George J. Giuffre - Wappingers Falls NY
Timothy R. Groves - Poughkeepsie NY
Werner Stickel - Ridgefield CT
Maris A. Sturans - Hopewell Junction NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01J 314

US Classification:

250396R

Abstract:

An electrostatic deflection plate for charged particle beam systems is formed of a planar semiconductive substrate having a conductive region at the substrate surface. The conductive region is diffused or implanted into the body of the substrate, or one or more conductive layers are deposited upon the substrate surface. The substrate material is preferably silicon and the diffused or implanted region is formed of a nonmagnetic, nonoxidizable metal such as gold or platinum. The deposited conductive region may be formed of a single layer of these or similar metals, one or more conductive underlayers with a nonmagnetic, nonoxidizable overlayer, a single or multilayer structure with a conductive oxide on the outermost layer, or a metallo-organic compound which forms a conductive layer during following heat treatment. The deflection plates are fabricated using conventional semiconductor processes and form durable structures which minimize eddy current effects.

US Patent:

50435868, Aug 27, 1991

Filed:

Oct 25, 1990

Appl. No.:

7/603137

Inventors:

George J. Giuffre - Wappingers Falls NY
Maris A. Sturans - Poughquag NY
James F. White - Newburgh NY
Robert R. Wilbarg - Hopewell Junction NY

Assignee:

International Business Machines Corporation - Armonk NY

International Classification:

H01J 37304

US Classification:

2504911

Abstract:

An improved structure for electron beam lithography grids and a method of fabricating such grids yields calibration grids having grid lines coplanar with the surface of a the grid body and laterally supported by grooves formed in the grid body and which can also be cleaned after contamination by outgassing resist during use by virtue of the provision of such lateral support for the grid lines. The grid exhibits improved accuracy due to the technique of fabrication of the grooves. The invention thus allows the electron beam lithography process to be conducted with less expense and at a greater speed. The improved accuracy of the calibration grid also permits integrated circuits and masks used in the fabrication of such devices to be designed more flexibly and fabricated at reduced cost and improved integration densities and manufacturing yields.