Garret M Miyake

US Patent:

20210363378, Nov 25, 2021

Filed:

Jul 30, 2021

Appl. No.:

17/390238

Inventors:

- Fort Collins CO, US
Garret MIYAKE - Fort Collins CO, US
Ryan Michael PEARSON - Berkeley CA, US

Assignee:

Colorado State University Research Foundation - Fort Collins CO

International Classification:

C09D 155/00
C08F 299/04
C08K 5/00
C08K 3/22
C08K 13/02
C09D 5/33
C09D 5/32
C09D 7/41
C09D 7/61

Abstract:

Polymer composite photonic crystal materials are disclosed as coatings which have high reflection (>30%) in a specific range of the electromagnetic spectrum, such as ultraviolet (

US Patent:

20210355261, Nov 18, 2021

Filed:

Jul 30, 2021

Appl. No.:

17/390259

Inventors:

- Fort Collins CO, US
Matthew David Ryan - Berkeley CA, US
Garret Miyake - Fort Collins CO, US

Assignee:

Colorado State University Research Foundation - Fort Collins CO

International Classification:

C08F 299/04
C09D 153/00
G02B 1/00
B29D 11/00

Abstract:

Polymer composite photonic crystal materials are disclosed as coatings with topcoats having high reflection (>30%) in a specific range of the electromagnetic spectrum, such as ultraviolet (

US Patent:

20160024244, Jan 28, 2016

Filed:

Apr 28, 2015

Appl. No.:

14/698520

Inventors:

Yan XIA - Mountain View CA, US
Benjamin R. SVEINBJORNSSON - Pasadena CA, US
Robert H. GRUBBS - South Pasadena CA, US
Raymond WEITEKAMP - Pasadena CA, US
Garret M. MIYAKE - Altadena CA, US
Victoria PIUNOVA - Altadena CA, US
Christopher Scot DAEFFLER - Pasadena CA, US

International Classification:

C08G 61/12

Abstract:

The invention provides a class of wedge-type block copolymers having a plurality of chemically different blocks, at least a portion of which incorporates a wedge group-containing block providing useful properties. For example, use of one or more wedge group-containing blocks in some block copolymers of the invention significantly inhibits chain entanglement and, thus, the present block copolymers materials provide a class of polymer materials capable of efficient molecular self-assembly to generate a range of structures, such as periodic nanostructures and microstructures. Materials of the present invention include copolymers having one or more wedge group-containing blocks, and optionally for some applications copolymers also incorporating one or more polymer side group-containing blocks. The present invention also provides useful methods of making and using wedge-type block copolymers.

US Patent:

20150018446, Jan 15, 2015

Filed:

Jul 15, 2014

Appl. No.:

14/331323

Inventors:

- Pasadena CA, US
Garret M. Miyake - Altadena CA, US

International Classification:

C08F 2/48

US Classification:

522 67

Abstract:

The present invention is directed to method of forming a polymer comprising exposing a mixture comprising an organic pre-polymer, an organic photoredox catalyst, and an organic initiator to a source of visible or near-infrared light under conditions and for a time sufficient to polymerize the organic pre-polymer, and polymers and articles derived therefrom.

US Patent:

20140243483, Aug 28, 2014

Filed:

Feb 25, 2014

Appl. No.:

14/188961

Inventors:

- Pasadena CA, US
Garret M. Miyake - Altadena CA, US
Raymond Weitekamp - Glendale CA, US
Victoria Piunova - Altadena CA, US

Assignee:

California Institute of Technology - Pasadena CA

International Classification:

G02B 5/30

US Classification:

525452

Abstract:

Described herein are copolymers constructed from chiral, non-racemic monomers, which self-assemble to photonic crystals. The difficulty of incorporating chiral elements into photonic crystals has limited the ability to generate unique bandstructures for different circular polarizations of light. The materials and methods described herein relate to easily, predictably fabricating chiral photonic crystals having desirable optical properties.