Gamaralalage G Padmabandu

US Patent:

6392743, May 21, 2002

Filed:

Feb 29, 2000

Appl. No.:

09/515974

Inventors:

Paolo Zambon - San Diego CA
Gamaralalage G. Padmabandu - San Diego CA
Tom A. Watson - Carlsbad CA
Palash P. Das - Vista CA

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

G03B 2772

US Classification:

355 69, 355 67, 355 77, 372 57

Abstract:

A lithograph quality optimization process for controlling laser beam parameters when changing operating modes. The laser is programmed to automatically conduct an optimization procedure preferably in less than one minute to adjust laser operating parameters such as blower speed, total gas pressure and F partial pressure in order to optimize beam quality parameters.

US Patent:

6721340, Apr 13, 2004

Filed:

Jun 30, 2000

Appl. No.:

09/608543

Inventors:

Igor V. Fomenkov - San Diego CA
Armen Kroyan - San Diego CA
Jesse D. Buck - San Marcos CA
Palash P. Das - Vista CA
Richard L. Sandstrom - Encinitas CA
Frederick G. Erie - Encinitas CA
John M. Algots - San Diego CA
Gamaralalage G. Padmabandu - San Diego CA

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 310

US Classification:

372 25, 372 57

Abstract:

A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1. 0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

US Patent:

6882674, Apr 19, 2005

Filed:

Dec 21, 2001

Appl. No.:

10/036676

Inventors:

Christian J. Wittak - San Diego CA, US
William N. Partlo - Poway CA, US
Richard L. Sandstrom - Encinitas CA, US
Paul C. Melcher - El Cajon CA, US
David M. Johns - Lakeside CA, US
Robert B. Saethre - San Diego CA, US
Richard M. Ness - San Diego CA, US
Curtis L. Rettig - Vista CA, US
Robert A. Shannon - Ramona CA, US
Richard C. Ujazdowski - San Diego CA, US
Shahryar Rokni - Carlsbad CA, US
Scott T. Smith - San Diego CA, US
Stuart L. Anderson - San Diego CA, US
John M. Algots - San Diego CA, US
Ronald L. Spangler - Arlington MA, US
Igor V. Fomenkov - San Diego CA, US
Thomas D. Steiger - San Diego CA, US
Jerome A. Emilo - San Diego CA, US
Clay C. Titus - San Diego CA, US
Alex P. Ivaschenko - La Jolla CA, US
Paolo Zambon - San Diego CA, US
Gamaralalage G. Padmabandu - San Diego CA, US
Mark S. Branham - Fallbrook CA, US
Sunjay Phatak - Alpine CA, US
Raymond F. Cybulski - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S003/22

US Classification:

372 58, 372 55, 372 57, 372 59

Abstract:

The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0. 25 milliseconds between pulses.

US Patent:

7079556, Jul 18, 2006

Filed:

Sep 24, 2003

Appl. No.:

10/670406

Inventors:

Igor V. Fomenkov - San Diego CA, US
Armen Kroyan - San Diego CA, US
Jesse D. Buck - San Marcos CA, US
Palash P. Das - Vista CA, US
Richard L. Sandstrom - Encinitas CA, US
Frederick G. Erie - Encinitas CA, US
John Martin Algots - San Diego CA, US
Gamaralalage G. Padmabandu - San Diego CA, US

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3/09
H01S 3/10

US Classification:

372 9, 372102

Abstract:

A technique for bandwidth control of an electric discharge laser. Line narrowing equipment is provided having at least one piezoelectric drive and a fast bandwidth detection means and a bandwidth control having a time response of less than about 1. 0 millisecond. In a preferred embodiment wavelength tuning mirror is dithered at dither rates of more than 500 dithers per second within a very narrow range of pivot angles to cause a dither in nominal wavelength values to produce a desired effective bandwidth of series of laser pulses.

US Patent:

20050100072, May 12, 2005

Filed:

Aug 24, 2004

Appl. No.:

10/925746

Inventors:

Rajasekhar Rao - San Diego CA, US
Weiman Zhang - San Diego CA, US
James Howey - Vista CA, US
Gamaralalage Padmabandu - San Diego CA, US
Paolo Zambon - San Diego CA, US
Richard Sandstrom - Encinitas CA, US

International Classification:

H01S003/22

US Classification:

372055000, 372009000

Abstract:

A high power gas discharge laser for and method of producing laser output light pulses of high energy density is disclosed which may comprise a laser output light pulse beam optical track having a plurality of modular components arranged in order from a laser light source to a laser system output port and defining a laser output light pulse beam path having a single centerline axis; a first optical module and a second optical module in series in the optical track; a flexible interface element intermediate the first and the second optical module and rigidly attached to each of the first and second optical modules; and an optical element having a fixed position in the output laser pulse beam path comprising a rigid attachment to the first optical module, and extending within the flexible interface element. The optical element may comprise a beam expander, which may comprise a lensed beam expander. The optical element may comprise at least a part of a telescoping lens set forming an optical beam expander and the at least a part of a telescoping lens set comprises the entire telescoping lens set forming the optical beam expander or the at least a part of a telescoping lens set may comprise a first part of the beam expander cooperating with at least a second part located in a subsequent optical module in the laser output pulse beam optical track along the same optical centerline axis. A plurality of aligning mechanisms may align the optical element to a first and a second axis of the laser output pulse beam, the first and second axes being generally orthogonal to each other and orthogonal to the optical centerline axis, and also along the optical centerline axis. The beam expander may incorporate as one optic the output coupler optic and may have a moveable lens to enable a range of magnifications.

US Patent:

60611294, May 9, 2000

Filed:

Jan 22, 1999

Appl. No.:

9/236148

Inventors:

Alexander I. Ershov - San Diego CA
Gamaralalage G. Padmabandu - San Diego CA
Palash P. Das - Vista CA

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

G01J 318

US Classification:

356328

Abstract:

A compact high resolution grating spectrometer. A beam of expanding light from a light source is collimated and the collimated beam is expanded with a beam expander before illuminating a reflecting grating. The expansion of the beam permits high resolution in a small package. In preferred embodiments mirror arrangements are provided to produce double reflections off the reflecting grating to further improve the resolution of the spectrometer.

US Patent:

61283231, Oct 3, 2000

Filed:

Sep 18, 1998

Appl. No.:

9/157067

Inventors:

David W. Myers - Poway CA
Herve A. Besaucele - La Jolla CA
Palash P. Das - Vista CA
Thomas P. Duffey - San Diego CA
Alexander I. Ershov - San Diego CA
Igor V. Fomenkov - San Diego CA
Thomas Hofmann - San Diego CA
Richard G. Morton - San Diego CA
Richard M. Ness - San Diego CA
Peter C. Newman - Encinitas CA
Robert G. Ozarski - Poway CA
Gamaralalage G. Padmabandu - San Diego CA
William N. Partlo - Poway CA
Daniel A. Rothweil - San Diego CA
Richard L. Sandstrom - Encinitas CA
Paul S. Thompson - Santee CA
Richard C. Ujazdowski - San Diego CA
Tom A. Watson - Carlsbad CA
R. Kyle Webb - Escondido CA
Paolo Zambon - San Diego CA

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 300

US Classification:

372 38

Abstract:

The present invention provides a reliable modular production quality excimer laser capable of producing 10 mJ laser pulses at 2000 Hz with a full width half, maximum bandwidth of about 0. 6 pm or less. Replaceable modules include a laser chamber; a pulse power system comprised of three modules; an optical resonator comprised of a line narrowing module and an output coupler module; a wavemeter module, an electrical control module, a cooling water module and a gas control module. Improvements in the laser chamber permitting the higher pulse rates and improved bandwidth performance include a single upstream preionizer tube and a high efficiency chamber. The chamber is designed for operation at lower fluorine concentration. Important improvements have been provided in the pulse power unit to produce faster rise time and improved pulse energy control. These improvements include an increased capacity high voltage power supply with a voltage bleed-down circuit for precise voltage trimming, an improved commutation module that generates a high voltage pulse from the capacitors charged by the high voltage power supply and amplifies the pulse voltage 23 times with a very fast voltage transformer having a secondary winding consisting of a single four-segment stainless steel rod.

US Patent:

6320892, Nov 20, 2001

Filed:

Oct 18, 1999

Appl. No.:

9/420297

Inventors:

Gamaralalage G. Padmabandu - San Diego CA
Palash P. Das - Vista CA
Tom A. Watson - Carlsbad CA
Paolo Zambon - San Diego CA

Assignee:

Cymer, Inc. - San Diego CA

International Classification:

H01S 3223

US Classification:

372 59

Abstract:

An excimer laser system with an automatic fluorine control system to permit precise control of the fluorine concentration within an F. sub. 2 "sweet spot" in a gas discharge laser chamber. This is done with a computer control system which monitors laser parameters, determines. DELTA. E/. DELTA. V, the change of pulse energy with voltage, and automatically and precisely controls the fluorine concentration based on. DELTA. E/. DELTA. V without the need to actually measure the fluorine concentration. The present invention is especially useful in lithography environments in which photo resist having a wide range of sensitivity are used. The present invention permits operation of the laser at substantially maximum efficiency over a wide range of pulse energy outputs.