A method for forming a contactless flash memory cell array is disclosed. According to an embodiment of the invention, a plurality of active regions is formed on a substrate. An insulating layer is then deposited over the active regions, and a portion of the insulating layer is removed to form a one-dimensional slot and to provide access to the active regions. A bit line is then formed in the slot in contact with the active regions.
Simultaneous Selective Polymer Deposition And Etch Pitch Doubling For Sub 50Nm Line/Space Patterning
Qiquan Geng - San Jose CA, US Jeff J Xu - San Jose CA, US Everett B Lee - Los Altos CA, US Michael T Ru - Santa Clara CA, US Hsu-en Yang - San Jose CA, US Chung Hui - San Jose CA, US
First radicals and second radicals are simultaneous deposited into a space defined by two adjacent lines of photoresists and an underlying layer. A portion of the first radicals and the second radicals combine to form a polymer layer on the layer in the center of the space, and substantially simultaneously, another portion of thee first radicals remove the underlying layer near the base of the photoresists. The first radicals may be fluorine-rich and the second radicals may be carbon-rich.
Direct Alignment Scheme Between Multiple Lithography Layers
A method for directly aligning multiple lithography masking layers. The method may be used to fabricate a flash plus logic structure. The flash plus logic structure may comprise a flash memory cell, a logic cell and a transistor.
A method for forming a contactless flash memory cell array is disclosed. According to an embodiment of the invention, a plurality of active regions is formed on a substrate. An insulating layer is then deposited over the active regions, and a portion of the insulating layer is removed to form a one-dimensional slot and to provide access to the active regions. A bit line is then formed in the slot in contact with the active regions.
Method For Improved Line Patterning By Chemical Diffusion
Everett Lee - Los Altos CA, US Susan Kao - Los Altos CA, US
International Classification:
G03F007/40
US Classification:
430/313000, 430/322000, 430/330000
Abstract:
A method and articles of manufacture created from this method wherein a portion of a layer of photoresist material are irradiated to cause the creation of a chemical within that portion, and then the passage of time and/or the application of heat is used to cause the chemical to propagate to another portion of the layer of photoresist material.
Method For Improved Line Patterning By Chemical Diffusion
Everett Lee - Los Altos CA, US Susan Kao - Los Altos CA, US
International Classification:
G03F007/40
US Classification:
430/330000, 430/313000, 430/322000
Abstract:
A method and articles of manufacture created from this method wherein a portion of a layer of photoresist material are irradiated to cause the creation of a chemical within that portion, and then the passage of time and/or the application of heat is used to cause the chemical to propagate to another portion of the layer of photoresist material.
Direct Alignment Scheme Between Multiple Lithography Layers
Derchang Kau - Cupertino CA, US Khaled Hasnat - San Jose CA, US Everett Lee - Los Altos CA, US
Assignee:
Intel Corporation
International Classification:
G03F007/36
US Classification:
430/311000, 430/316000, 430/317000
Abstract:
A method for directly aligning multiple lithography masking layers. The method may be used to fabricate a flash plus logic structure. The flash plus logic structure may comprise a flash memory cell, a logic cell and a transistor.
Sushil Padlyar - Santa Clara CA, US Hsuen Yang - San Jose CA, US Everett Lee - Los Altos CA, US
International Classification:
G03B027/54
US Classification:
355067000, 430005000
Abstract:
A hybrid light source for photolithography is disclosed. According to an embodiment of the invention, a light source comprises, a head, a first set of poles coupled to the head, the first set of poles are located approximately at an outer edge of the head, and a second set of poles coupled to the head located between the outer edge and a center of the head. According to a further embodiment of the invention, the poles are adjustable to change the characteristics of the light source.
Mutual Mobile since Sep 2012
Senior Project Manager
OMGPOP May 2011 - Jan 2012
Studio Head
Razor's Edge Development Aug 2010 - May 2011
President and Co-Founder
Sony Online Entertainment Oct 2009 - Jun 2010
Production Director
Sony Online Entertainment Sep 2008 - Oct 2009
Producer
Education:
The University of Texas at Austin 1994 - 1998
BS, Physics
Skills:
Production Xbox 360 PS3 Console MMO Social Games Mobile Games Video Games Game Development Video Game Development
She was allegedly raped by four suspects Kaivon Washington, Everett Lee, Casen Carver and Desmond Carter in their car after a night of drinking at a bar in Tigerland, which is LSU's social hub notorious for crime, poor lighting and no sidewalks.
Date: May 27, 2024
Category: U.S.
Source: Google
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Everett Lee
Education:
Santa Rita Elementary School
About:
Minecraft Videos, Minecraft videos, and more minecraft videos
Account Manager / Recruiter at The Software Force Demonstrated experience managing client relationships and recruiting / placing candidates at all levels with a sense of urgency. Builds lasting relationships... Demonstrated experience managing client relationships and recruiting / placing candidates at all levels with a sense of urgency. Builds lasting relationships within multiple corporate cultures, organizations, levels and disciplines, and finds hard to find skills. These lasting relationships have led...