Erik J Bjornard

US Patent:

RE39215, Aug 1, 2006

Filed:

Aug 19, 1997

Appl. No.:

08/914868

Inventors:

Erik J. Bjornard - Northfield MN, US

Assignee:

Tru Vue, Inc. - Chicago IL

International Classification:

G02B 1/10
G02B 5/08

US Classification:

359586, 359588, 359580, 427162

Abstract:

A multilayer antireflection coating for a temperature sensitive substrate such as plastic. One layer is a DC reactively sputtered metal oxide which may be deposited quickly and without imparting a large amount of heat to the substrate. Another layer has a refractive index lower than the substrate.

US Patent:

20120255855, Oct 11, 2012

Filed:

Mar 26, 2012

Appl. No.:

13/430005

Inventors:

Erik Bjornard - Northfield MN, US

Assignee:

SAGE ELECTROCHROMICS, INC. - Faribault MN

International Classification:

C23C 14/34
C23C 14/06

US Classification:

2041921, 20429802

Abstract:

A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or rate of deposition of a metal or lithium in a sputter process by introducing a quantity of reactive gas over a specified area in the sputter chamber. This method is applicable to planar and rotating targets.

US Patent:

20130015054, Jan 17, 2013

Filed:

Sep 18, 2012

Appl. No.:

13/622063

Inventors:

SAGE Electrochromics, Inc. - Faribault MN, US
Erik Bjornard - Northfield MN, US

Assignee:

SAGE Electrochromics, Inc. - Faribault MN

International Classification:

C23C 14/34

US Classification:

2041921, 20429807

Abstract:

A method and apparatus for providing uniform coatings of lithium on a substrate are provided. In one aspect of the present invention is a method of selectively controlling the uniformity and/or rate of deposition of a metal or lithium in a sputter process by introducing a quantity of reactive gas over a specified area in the sputter chamber. This method is applicable to planar and rotating targets.

US Patent:

20140000191, Jan 2, 2014

Filed:

Jun 27, 2013

Appl. No.:

13/929325

Inventors:

Robert Anglemier - Waterville MN, US
Bryan D. Greer - Northfield MN, US
Rino Messere - Herzogenrath, DE
Jerome Korus - Lakeville MN, US
Erik Bjornard - Northfield MN, US

Assignee:

SAGE Electrochromics, Inc. - Faribault MN

International Classification:

E06B 3/66
E06B 3/667

US Classification:

52204593, 403294

Abstract:

An insulative separation element bridges first and second conductive spacer ends of a spacer frame of an active or insulated glazing unit. The insulative separation element includes first and second outer sections dimensioned for placement into the first and second conductive spacer ends. The insulative separation element includes an intermediate section connecting the first and second outer sections. The intermediate section has opposing first and second faces dimensioned for abutment with and insulative separation of the first and second spacer ends, respectively.

US Patent:

51567270, Oct 20, 1992

Filed:

Oct 12, 1990

Appl. No.:

7/596853

Inventors:

Erik J. Bjornard - Northfield MN
Michael J. Valiska - Lakeville MN
Clifford L. Taylor - Northfield MN

Assignee:

Viratec Thin Films, Inc. - Faribault MN

International Classification:

C23C 1434

US Classification:

20429811

Abstract:

A mask arrangement is located between the cathode and substrate in an in-line sputtering system. The relative shape of the mask may be changed from outside the system. Thus, film thickness uniformity can be modified and controlled without interrupting the sputtering process.

US Patent:

6068738, May 30, 2000

Filed:

Nov 13, 1997

Appl. No.:

8/970177

Inventors:

Erik J. Bjornard - Northfield MN
Clifford E. Taylor - Nerstrand MN
Debra M. Steffenhagen - Santa Rosa CA
Eric W. Kurman - Healdsburg CA

International Classification:

C23C 1434
C23C 1600
C23C 1654

US Classification:

20419212

Abstract:

A method, apparatus and carrier for coating a CRT screen after assembly. The method and apparatus includes isolating a surface portion of the CRT to be coated from the remaining surface to prevent or minimize coating problems resulting from outgassing or difficulty in controlling coating process parameters and to isolate noncompatible components from the deposition environment.

US Patent:

51064740, Apr 21, 1992

Filed:

Nov 21, 1990

Appl. No.:

7/616673

Inventors:

Eric R. Dickey - Northfield MN
Erik J. Bjornard - Northfield MN
James J. Hoffmann - Boise ID

Assignee:

Viratec Thin Films, Inc. - Faribault MN

International Classification:

C23C 1434

US Classification:

20429814

Abstract:

An in-line sputtering system with rotating cylindrical magnetrons is fitted with a system of anodes having a large surface area. The surface area is equal to or greater than the surface area of the sputtering chambers' internal walls. The anodes may be grounded, allowed to float electrically, or connected to a separate bias power supply. The anode surfaces are protected from contamination by sputtered material or are designed so the electron collecting surface may be replaced during the sputtering process. The anodes may be equipped with a magnet array for improving electron collecting efficiency.

US Patent:

51005271, Mar 31, 1992

Filed:

Oct 18, 1990

Appl. No.:

7/600203

Inventors:

David E. Stevenson - Northfield MN
Erik J. Bjornard - Northfield MN
Geoffrey Humberstone - Northfield MN

Assignee:

Viratec Thin Films, Inc. - Faribault MN

International Classification:

C23C 1435

US Classification:

20429822

Abstract:

A rotatable magnetron having a cathode and a bearing assembly wherein the cathode may be removed from a coating chamber while the bearing assembly remains in place.