David Eric Warren

US Patent:

47939087, Dec 27, 1988

Filed:

Dec 29, 1986

Appl. No.:

6/947141

Inventors:

Gene Scott - El Toro CA
Charles W. Kohlenberger - Fullerton CA
David M. Warren - Chino Hills CA

Assignee:

Rockwell International Corporation - El Segundo CA

International Classification:

C23C 1446

US Classification:

20419226

Abstract:

A method of fabricating multiple layer, solid, thin films on a substrate having a surface to be coated, the method providing control over the thickness, stoichiometry, and morphology of each separate layer formed by a method comprising steps: A. forming a first ion beam from an inert gas; B, bombarding a target surface with said first ion beam in a vacuum chamber to generate a vapor cloud composed of the target material atoms by the process of sputtering; C. adjusting the respective positions of the substrate surface for coating and the target surface to promote the condensation of the vapor upon the substrate surface for coating; D. forming a second ion beam, the second ion beam's ions being formed from a mixture of inert and reactive gases; E. bombarding the substrate surface simultaneously with the second ion beam to promote a chemical reaction between the target vapor atoms and the chemically reactive gas ions as the target atoms and the chemically reactive gas ions impinge upon the substrate surface for coating, the resulting chemical compound building up in thickness as a homogeneous thin solid film layer; F. positioning an alternative target material in the place occupied by the previous one; G.

US Patent:

43177000, Mar 2, 1982

Filed:

Aug 20, 1980

Appl. No.:

6/179843

Inventors:

Kunihide Tanaka - Irvine CA
Michael T. Elliott - Carbon Canyon CA
Sam Chung - Costa Mesa CA
James Pau - Irvine CA
Linda Gray - Fullerton CA
Liping D. Hou - Seal Beach CA
Mary F'Mayer - Garden Grove CA
David Warren - Fullerton CA
Karen Finch - Mission Viejo CA

Assignee:

Rockwell International Corporation - El Segundo CA

International Classification:

B44C 122
C03C 1500
C03C 2506

US Classification:

156652

Abstract:

A method of fabricating a bubble domain device composite structure on a substrate of depositing a barrier layer of a suitable polymeric dielectric material on the substrate; subsequently depositing a layer of electrically conductive material thereover; subsequently depositing a spacer layer of a liquid polymeric dielectric material over the conductive layer; processing the spacer layer so that the surface of the spacer layer is substantially planar; and subsequently depositing a layer of a magnetically operative material over the spacer layer.