Chien-Fu Shih - Sunnyvale CA, US Yongming Zhang - San Diego CA, US Brian H. Moeckly - Palo Alto CA, US
Assignee:
Conductus, Inc. - Sunnyvale CA
International Classification:
H03H 7/01
US Classification:
505210, 333 99 S, 333174, 333205, 505700, 505866
Abstract:
A method and apparatus for providing dynamic and remote tuning of a cryo-cooled bandpass filter is disclosed. The device includes resonator element and a voltage sensitive element as part of the capacitance in a narrow band filter circuit. A varactor such as a GaAs varactor may be used. Alternatively, a capacitor having a voltage-sensitive dielectric such as SrTiOmay be used. A computer may be connected to the varactor to provide for automated tuning. The voltage-sensitive capacitor may be integral with the resonator element. The invention provides for remote and dynamic tuning of a narrow bandpass filter while located within its sealed cryo-cooled environment.
Varactor Tuning For A Narrow Band Filter Including An Automatically Controlled Tuning System
Chien-Fu Shih - Sunnyvale CA, US Yongming Zhang - San Diego CA, US Brian H. Moeckly - Palo Alto CA, US
Assignee:
Conductus, Inc. - Sunnyvale CA
International Classification:
H03H 7/12 H01B 12/02
US Classification:
333 171, 333 99 S, 505210
Abstract:
A method and apparatus for providing dynamic and remote tuning of a cryo-cooled bandpass filter is disclosed. The device includes resonator element and a voltage sensitive element as part of the capacitance in a narrow band filter circuit. A varactor such as a GaAs varactor may be used. Alternatively, a capacitor having a voltage-sensitive dielectric such as SrTiOmay be used. A computer may be connected to the varactor to provide for automated tuning. The voltage-sensitive capacitor may be integral with the resonator element. The invention provides for remote and dynamic tuning of a narrow bandpass filter while located within its sealed cryo-cooled environment.
Growth Of In-Situ Thin Films By Reactive Evaporation
A method of forming MgBfilms in-situ on a substrate includes the steps of (a) depositing boron onto a surface of the substrate in a deposition zone; (b) moving the substrate into a reaction zone containing pressurized, gaseous magnesium; (c) moving the substrate back into the deposition zone; and (d) repeating steps (a)-(c). In a preferred embodiment of the invention, the substrate is moved into and out of the deposition zone and the reaction zone using a rotatable platen.
Varactor Tuning For A Narrow Band Filter Having Shunt Capacitors With Different Capacitance Values
Chien-Fu Shih - Sunnyvale CA, US Yongming Zhang - San Diego CA, US Brian H. Moeckly - Palo Alto CA, US
Assignee:
Conductus, Inc. - Santa Barbara CA
International Classification:
H03H 7/12 H01B 12/02
US Classification:
505210, 333 99 S, 333174, 333175
Abstract:
An apparatus for providing dynamic and remote tuning of a cryo-cooled bandpass filter is disclosed. The device includes resonator element and a voltage sensitive element as part of the capacitance in a narrow band filter circuit. A varactor such as a GaAs varactor may be used. Alternatively, a capacitor having a voltage-sensitive dielectric such as SrTiOmay be used. A computer may be connected to the varactor to provide for automated tuning. The voltage-sensitive capacitor may be integral with the resonator element. The invention provides for remote and dynamic tuning of a narrow bandpass filter while located within its sealed cryo-cooled environment.
Rf-Properties-Optimized Compositions Of (Re)Bacuo Thin Film Superconductors
Brian Moeckly - Santa Barbara CA, US Viktor Gliantsev - San Jose CA, US Shing-jen (Luke) Peng - Mountain View CA, US Balam Willemsen - Newbury Park CA, US
Assignee:
Superconductor Technologies, Inc. - Santa Barbara CA
International Classification:
H01L 39/00
US Classification:
505779, 505776, 505777, 505778, 505780
Abstract:
The films of this invention are high temperature superconducting (HTS) thin films specifically optimized for microwave and RF applications. In particular, this invention focuses on compositions with a significant deviation from the 1:2:3 stoichiometry in order to create the films optimized for microwave/RF applications. The RF/microwave HTS applications require the HTS thin films to have superior microwave properties, specifically low surface resistance, R, and highly linear surface reactance, X, i. e. high J. As such, the invention is characterized in terms of its physical composition, surface morphology, superconducting properties, and performance characteristics of microwave circuits made from these films.
Device And Method For Fabricating Thin Films By Reactive Evaporation
A device for fabricating thin films on a substrate includes a vacuum chamber, a rotatable platen configured to hold one or more substrates within the vacuum chamber, and a housing disposed within the vacuum chamber. The housing contains a heating element and is configured to enclose an upper surface of the platen and a lower portion configured to partially enclose an underside surface of the platen which forms a reaction zone. A heated evaporation cell is operatively coupled to the lower portion of the housing and configured to deliver a pressurized metallic reactant to the reaction zone. The device includes a deposition zone disposed in the vacuum chamber and isolated from the reaction zone and is configured to deposit a deposition species to the exposed underside of the substrates when the substrates are not contained in the reaction zone.
Device And Method For Fabricating Thin Films By Reactive Evaporation
505150, 505826, 505950, 118726, 118729, 118719, 118723 VE
Abstract:
A device for fabricating thin films on a substrate includes a vacuum chamber, a rotatable platen configured to hold one or more substrates within the vacuum chamber, and a housing disposed within the vacuum chamber. The housing contains a heating element and is configured to enclose an upper surface of the platen and a lower portion configured to partially enclose an underside surface of the platen which forms a reaction zone. A heated evaporation cell is operatively coupled to the lower portion of the housing and configured to deliver a pressurized metallic reactant to the reaction zone. The device includes a deposition zone disposed in the vacuum chamber and isolated from the reaction zone and is configured to deposit a deposition species to the exposed underside of the substrates when the substrates are not contained in the reaction zone.
Brian Moeckly - Palo Alto CA, US Kookrin Char - Palo Alto CA, US
Assignee:
Conductis, Inc. - Sunnyvale CA
International Classification:
B23K001/00
US Classification:
228/101000
Abstract:
A process is provided for fabricating YBaCuOthin-film edge junctions in which no deposited barrier is employed. These devices display excellent RSJ-type I-V characteristics with values of Iand Rtunable over a useful range for operation of digital circuits.
Star Cryoelectronics Llc Apr 2017 - Aug 2019
Vice President, Materials R and D
Commonwealth Fusion Systems Apr 2017 - Aug 2019
Head of Superconductor R and D
Rocket Renewables Nov 1, 2011 - Apr 2017
Co-Founder and Chief Technology Officer
Superconductor Technologies Dec 2003 - Nov 2011
Director of Materials R and D
Conductus Jul 1994 - Dec 2003
Manager of Materials Science and Process Development
Education:
Cornell University 1987 - 1994
Doctorates, Doctor of Philosophy, Physics
Cornell University 1987 - 1989
Masters, Physics
Iowa State University 1982 - 1987
Bachelors, Bachelor of Science, Electrical Engineering, Physics
Skills:
Materials Science Thin Films R&D Physics Nanotechnology Materials Characterization Semiconductors Start Ups Process Simulation Spectroscopy Engineering Management Sensors Research and Development Cryogenics Failure Analysis Product Development
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