Borislav A Zlatanov

US Patent:

20130044301, Feb 21, 2013

Filed:

Aug 19, 2011

Appl. No.:

13/199112

Inventors:

Borislav Zlatanov - San Jose CA, US
Andrew M. Hawryluk - Los Altos CA, US

International Classification:

G03B 27/54

US Classification:

355 67, 355 77

Abstract:

A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking functions that have previously required relatively large mechanical devices. Methods of improving illumination field uniformity using the programmable illuminator are also disclosed.

US Patent:

6869155, Mar 22, 2005

Filed:

Aug 6, 2001

Appl. No.:

09/923755

Inventors:

Borislav Zlatanov - San Jose CA, US

Assignee:

Ultratech, Inc. - San Jose CA

International Classification:

B41J003/00

US Classification:

347 2, 347 1, 347 38

Abstract:

A method and apparatus for masking a workpiece with a layer of ink from an inkjet head is disclosed. The masking prevents exposure of select regions of a photosensitive workpiece. The apparatus includes a workpiece pre-aligner for movably supporting and aligning the workpiece. The inkjet head is arranged to be in operable communication with the photosensitive layer of the workpiece when positioned on the pre-aligner and is adapted for providing a select mask of opaque ink on a photosensitive layer. Where the photosensitive layer is a negative tone photoresist, upon exposure the portion of the photosensitive layer that is not exposed because of the presence of the mask is removed upon developing. In this manner, select regions of the workpiece can be kept clear of photoresist or otherwise patterned with indicia such as alphanumeric symbols or barcodes.