ChangFeng F. Xia - Plano TX, US Arunthathi Sivasothy - Plano TX, US Ricky A. Jackson - Richardson TX, US Asad M. Hauder - Plano TX, US
Assignee:
Texas Instruments Incorporated - Dallas TX
International Classification:
C23C 16/00
US Classification:
118715
Abstract:
A method of protecting an interconnect is provided. The method includes forming an integrated circuit structure having an interconnect, and depositing vaporized benzotriazole on the interconnect.
Vapor Deposition Of Benzotriazole (Bta) For Protecting Copper Interconnects
ChangFeng Xia - Plano TX, US Arunthathi Sivasothy - Plano TX, US Ricky Jackson - Richardson TX, US Asad Haider - Plano TX, US
International Classification:
H01L021/44
US Classification:
438/118000
Abstract:
A method of protecting an interconnect is provided. The method includes forming an integrated circuit structure having an interconnect, and depositing vaporized benzotriazole on the interconnect.
Vapor Deposition Of Benzotriazole (Bta) For Protecting Copper Interconnects
ChangFeng Xia - Plano TX, US Arunthathi Sivasothy - Plano TX, US Ricky Jackson - Richardson TX, US Asad Hauder - Plano TX, US
International Classification:
H01L 21/302
US Classification:
438690000
Abstract:
A method of protecting an interconnect is provided. The method includes forming an integrated circuit structure having an interconnect, and depositing vaporized benzotriazole on the interconnect.