Anthony V Debellis

US Patent:

6458872, Oct 1, 2002

Filed:

May 8, 2001

Appl. No.:

09/851453

Inventors:

Ramanathan Ravichandran - Nanuet NY
Joseph Suhadolnik - Yorktown Heights NY
Mervin G. Wood - Poughquag NY
Anthony Debellis - Garnerville NY
Robert E. Detlefsen - Putnam Valley NY
Revathi Iyengar - Courtland Manor NY
Jean-Pierre Wolf - Courtaman, CH

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C08K 53475

US Classification:

524 89, 524 91, 524 94

Abstract:

Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as -cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.

US Patent:

6515051, Feb 4, 2003

Filed:

Dec 18, 2001

Appl. No.:

10/023257

Inventors:

Ramanathan Ravichandran - Nanuet NY
Joseph Suhadolnik - Yorktown Heights NY
Mervin G. Wood - Poughquag NY
Anthony Debellis - Garnerville NY
Robert E. Detlefsen - Putnam Valley NY
Revathi Iyengar - Courtland Manor NY
Jean-Pierre Wolf - Courtaman, CH

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C08K 534

US Classification:

524 91, 503209, 427150, 548260

Abstract:

Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings. This is particularly the case when the 3-position of the phenyl ring is also substituted by phenyl or phenylalkyl such as -cumyl. Compounds where the 5-position of the benzo ring are substituted by perfluoroalkyl such as trifluoromethyl are particularly of interest for both their enhanced durability and for their excellent solubility and excellent color properties in some thermoplastic compositions when the phenyl ring is substituted at the 3-position by hydrogen or tert-alkyl.

US Patent:

7173128, Feb 6, 2007

Filed:

Aug 5, 2002

Appl. No.:

10/486134

Inventors:

Ramanathan Ravichandran - Suffern NY, US
Stephen Daniel Pastor - Mayhill NM, US
Deborah Judd - Poughkeepsie NY, US
Joseph Edmund Babiarz - Amawalk NY, US
Andrew Brian Naughton - Gipf-Oberfrick, CH
Mervin Gale Wood - Mobile AL, US
Anthony David Debellis - Stony Point NY, US
Rong Xiong - Dobbs Ferry NY, US
Robert Edward Detlefsen - Putnam Valley NY, US
Joseph Suhadolnik - Yorktown Heights NY, US

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C07D 413/02
C07D 265/22
A61K 31/536

US Classification:

544 92, 544 73, 5142305

Abstract:

The present invention relates to novel ultraviolet light absorbers of the benzoxazinone, oxanilide, benzylidene malonate, quinazoline and benzotriazole classes. The invention also relates to polymer and photographic compositions stabilized against the deleterious effects of light induced degradation which comprise the novel ultraviolet light absorbers.

US Patent:

7244776, Jul 17, 2007

Filed:

Dec 18, 2006

Appl. No.:

11/640808

Inventors:

Ramanathan Ravichandran - Suffern NY, US
Stephen Daniel Pastor - Mayhill NM, US
Deborah Judd - Poughkeepsie NY, US
Joseph Edmund Babiarz - Amawalk NY, US
Andrew Brian Naughton - Gipf-Oberfrick, CH
Mervin Gale Wood - Mobile AL, US
Anthony David Debellis - Stony Point NY, US
Rong Xiong - Dobbs Ferry NY, US
Robert Edward Detlefsen - Putnam Valley NY, US
Joseph Suhadolnik - Yorktown Heights NY, US

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

C08K 5/00

US Classification:

524 87

Abstract:

The present invention relates to novel ultraviolet light absorbers of the benzoxazinone, oxanilide, benzylidene malonate, quinazoline and benzotriazole classes. The invention also relates to polymer and photographic compositions stabilized against the deleterious effects of light induced degradation which comprise the novel ultraviolet light absorbers.

US Patent:

7541096, Jun 2, 2009

Filed:

May 30, 2003

Appl. No.:

10/517411

Inventors:

Jonathan Rogers - White Plains NY, US
Anthony David DeBellis - Stony Point NY, US
Stephen Daniel Pastor - Mayhill NM, US
Norihisa Dan - Yawata, JP
François Maike - Geispitzen, FR

Assignee:

Ciba Specialty Chemicals Corporation - Tarrytown NY

International Classification:

H01J 1/62
C09K 11/06

US Classification:

428690, 428917, 25230116, 25230127, 313504, 313506

Abstract:

Disclosed are electroluminescent devices that comprise organic layers that contain certain 2H-benzotriazole compounds. The 2H-benzotriazole compounds of blue-emitting, durable, organo-electroluminescent layers. The electroluminescent devices may be employed for full color display panels in for example mobile phones, televisions and personal computer screens.

US Patent:

20010007886, Jul 12, 2001

Filed:

Jan 11, 2001

Appl. No.:

09/760089

Inventors:

Ramanathan Ravichandran - Nanuet NY, US
Joseph Suhadolnik - Yorktown Heights NY, US
Mervin Wood - Poughquag NY, US
Anthony Debellis - Garnerville NY, US
Robert Detlefsen - Putnam Valley NY, US
Revathi Iyengar - Courtland Manor NY, US
Jean-Pierre Wolf - Courtaman, CH

International Classification:

C08K005/3475

US Classification:

524/091000

Abstract:

Benzotriazole UV absorbers which are substituted at the 5-position of the benzo ring by an electron withdrawing group exhibit enhanced durability and very low loss rates when incorporated into automotive coatings.

US Patent:

20080249269, Oct 9, 2008

Filed:

Mar 27, 2008

Appl. No.:

12/079605

Inventors:

Hui Chin - Katonah NY, US
Andrew J. Leggio - Franklin Square NY, US
Matthew E. Gande - Norwalk CT, US
Anthony D. DeBellis - Stony Point NY, US
Sai P. Shum - Pleasantville NY, US
Per Magnus Kristiansen - Zurich, CH
Klaus Stoll - Binzen, DE

International Classification:

C08F 2/00

US Classification:

526208

Abstract:

Disclosed are electret materials with outstanding thermal and charge stability. The electret materials comprise a melt blend of a thermoplastic polymer and one or more compounds selected from the aromatic trisamides. The aromatic trisamides are for example of the formulaThe melt blends are subjected to an electret treatment, for example a corona treatment. The electret materials are for example nonwoven polyolefin webs and are employed as filter materials, wipes, absorbent materials, filter masks, acoustic materials, printing substrates, measuring devices or contactless switches. The present electret materials may also comprise a further additive selected from the hindered amine light stabilizers and the hydroxyphenylalkylphosphonic esters or monoesters.

US Patent:

20110230109, Sep 22, 2011

Filed:

Jun 2, 2011

Appl. No.:

13/151732

Inventors:

Hui Chin - Katonah NY, US
Andrew J. Leggio - Franklin Square NY, US
Matthew E. Gande - Norwalk CT, US
Anthony D. DeBellis - Stony Point NY, US
Sai P. Shum - Pleasantville NY, US
Per Magnus Kristiansen - Zurich, CH
Klaus Stoll - Binzen, DE

International Classification:

C08K 5/20
C08L 23/12
C08K 5/5357
C08K 5/17
D04H 13/00

US Classification:

442327, 524227, 524229, 524132

Abstract:

Disclosed are electret materials with outstanding thermal and charge stability. The electret materials comprise a melt blend of a thermoplastic polymer and one or more compounds selected from the aromatic trisamides. The aromatic trisamides are for example of the formulaThe melt blends are subjected to an electret treatment, for example a corona treatment. The electret materials are for example nonwoven polyolefin webs and are employed as filter materials, wipes, absorbent materials, filter masks, acoustic materials, printing substrates, measuring devices or contactless switches. The present electret materials may also comprise a further additive selected from the hindered amine light stabilizers and the hydroxyphenylalkylphosphonic esters or monoesters.