Alexander A Schafgans

US Patent:

20180063935, Mar 1, 2018

Filed:

Oct 23, 2017

Appl. No.:

15/790576

Inventors:

- Veldhoven, NL
Daniel John William Brown - San Diego CA, US
Alexander Anthony Schafgans - San Diego CA, US
Palash Parijat Das - Oceanside CA, US

International Classification:

H05G 2/00
H01S 3/23
H01S 3/00
H01S 3/223

Abstract:

An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.

US Patent:

20170099721, Apr 6, 2017

Filed:

Dec 15, 2015

Appl. No.:

14/970402

Inventors:

- Veldhoven, NL
Daniel John William Brown - San Diego CA, US
Alexander Anthony Schafgans - San Diego CA, US
Palash Parijat Das - Oceanside CA, US

International Classification:

H05G 2/00

Abstract:

An optical source for a photolithography tool includes a source configured to emit a first beam of light and a second beam of light, the first beam of light having a first wavelength, and the second beam of light having a second wavelength, the first and second wavelengths being different; an amplifier configured to amplify the first beam of light and the second beam of light to produce, respectively, a first amplified light beam and a second amplified light beam; and an optical isolator between the source and the amplifier, the optical isolator including: a plurality of dichroic optical elements, and an optical modulator between two of the dichroic optical elements.

US Patent:

20160174351, Jun 16, 2016

Filed:

Jul 21, 2015

Appl. No.:

14/804976

Inventors:

- Veldhoven, NL
Michael Purvis - San Diego CA, US
Robert J. Rafac - San Diego CA, US
Alexander Schafgans - San Diego CA, US

International Classification:

H05G 2/00
G02B 27/14
G01J 11/00
G02B 26/08

Abstract:

A laser produced plasma extreme ultraviolet laser source comprising at least one variable radius mirror. The at least one variable radius mirror to adjust a beam diameter of a main pulse at a specified distance from a pre-pulse focal plane, where the pre-pulse radiates droplets into target droplets and the main pulse radiates the target droplets into a plasma state to generate the extreme ultraviolet radiation.

US Patent:

20160007434, Jan 7, 2016

Filed:

Jul 7, 2014

Appl. No.:

14/325153

Inventors:

- Veldhoven, NL
Jordan Jur - San Diego CA, US
Andrew LaForge - Poway CA, US
Daniel Brown - San Diego CA, US
Jason M. Arcand - Escondido CA, US
Alexander A. Schafgans - San Diego CA, US
Michael A. Purvis - San Diego CA, US

International Classification:

H05G 2/00

Abstract:

An initial pulse of radiation is generated; a section of the initial pulse of radiation is extracted to form a modified pulse of radiation, the modified pulse of radiation including a first portion and a second portion, the first portion being temporally connected to the second portion, and the first portion having a maximum energy that is less than a maximum energy of the second portion; the first portion of the modified pulse of radiation is interacted with a target material to form a modified target; and the second portion of the modified pulse of radiation is interacted with the modified target to generate plasma that emits extreme ultraviolet (EUV) light.

US Patent:

20150250045, Sep 3, 2015

Filed:

Feb 28, 2014

Appl. No.:

14/194027

Inventors:

- Veldhoven, NL
Daniel J.W. Brown - San Diego CA, US
Alexander Schafgans - San Diego CA, US
Michael David Caudill - San Diego CA, US
Daniel J. Golich - San Diego CA, US
Richard L. Sandstrom - Encinitas CA, US
Yoshiho Amada - San Diego CA, US

International Classification:

H05G 2/00
H01S 3/13
H01S 3/10

Abstract:

A system for an extreme ultraviolet (EUV) light source includes an optical amplifier including a gain medium positioned on a beam path, the optical amplifier configured to receive a light beam at an input and to emit an output light beam for an EUV light source at an output; a feedback system that measures a property of the output light beam and produces a feedback signal based on the measured property; and an adaptive optic positioned in the beam path and configured to receive the feedback signal and to adjust a property of the output light beam in response to the feedback signal.

US Patent:

20150222083, Aug 6, 2015

Filed:

Jan 9, 2015

Appl. No.:

14/593278

Inventors:

- Veldhoven, NL
Christo Liebenberg - San Marcos CA, US
Alexander Schafgans - San Diego CA, US

International Classification:

H01S 3/227

Abstract:

An extreme ultraviolet light system includes an optical amplifier system and a catalytic conversion system. Each optical amplifier of the optical amplifier system includes a gain medium in the form of a gas mixture that produces an amplified light beam. The optical amplifier system includes a fluid input and a fluid output through which the gas mixture flows. The catalytic conversion system is fluidly connected to the fluid output of the optical amplifier system and to the fluid input of the optical amplifier system. The catalytic conversion system includes a catalytic converter that includes a housing; a substrate within the housing including openings through which the gas mixture can flow; and a catalyst applied as a coating to the interior surfaces of the openings of the substrate, the catalyst including particles of metal. The particles of metal can be nanoparticles of precious metal.